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Annelisa B. Esparza

Publications and source records attributed to Annelisa B. Esparza.

A Method for Measuring Optical Distortion in Curved Optical Surfaces using Moiré Interferometry

In FY2020, KSC’s Applied Physics Lab created a computer based image processing system to allow inspection of the new visors being developed for the Artemis Program. This system was based on an ASTM standard where the distortion of an image is used to determine the optical aberrations in a visor, but this approach is restricted to small fields-of-view (small areas of the visor) and is limited in its ability to reliably detect and measure distortion. From our experience with flat surface inspection, we know that other optical techniques can offer higher sensitivity and accuracy. [1] This memorandum describes a method to model and measure the distortion in curved optical surfaces using moir´e interferometry. We were able to apply this process to examine samples of the xEMU Artemis astronaut helmets. Design details are provided along with examples to illustrate performance.

Optical Distortion↗