Belchenko, Yu. | Search NASA

DOE OSTI2016

High voltage holding in the negative ion sources with cesium deposition

High voltage holding of the large surface-plasma negative ion source with cesium deposition was studied. It was found that heating of ion-optical system electrodes to temperature >100 °C facilitates the source conditioning by high voltage pulses in vacuum and by beam shots. The procedure of electrode conditioning and the data on high-voltage holding in the negative ion source with small cesium seed are described. The mechanism of high voltage holding improvement by depletion of cesium coverage is discussed.

46 INSTRUMENTATION RELATED TO NUCLEAR SCIENCE AND ↗

DOE OSTI2016

Efficient cesiation in RF driven surface plasma negative ion source

Experiments on hydrogen negative ions production in the large radio-frequency negative ion source with cesium seed are described. The system of directed cesium deposition to the plasma grid periphery was used. The small cesium seed (∼0.5 G) provides an enhanced H{sup −} production during a 2 month long experimental cycle. The gradual increase of negative ion yield during the long-term source runs was observed after cesium addition to the source. The degraded H{sup −} production was recorded after air filling to the source or after the cesium washing away from the driver and plasma chamber walls. The following source conditioning by beam shots produces the gradual recovery of H{sup −} yield to the high value. The effect of H{sup −} yield recovery after cesium coverage passivation by air fill was studied. The concept of cesium coverage replenishment and of H{sup −} yield recovery due to sputtering of cesium from the deteriorated layers is discussed.

46 INSTRUMENTATION RELATED TO NUCLEAR SCIENCE AND ↗