Functionalization of Metal Surfaces using Hydride Intermediates.
Abstract not provided.
Robinson, David↗
Engineering topics
Publications and source records attributed to Benson, David M..
Abstract not provided.
A method of electroless atomic layer deposition is described. The method electrolessly generates a layer of sacrificial material on a surface of a first material. The method adds doses of a solution of a second material to the substrate. The method performs a galvanic exchange reaction to oxidize away the layer of the sacrificial material and deposit a layer of the second material on the surface of the first material. The method can be repeated for a plurality of iterations in order to deposit a desired thickness of the second material on the surface of the first material.