Pushing the limits: an instrument for hard X-ray imaging below 20 nm
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Engineering topics
Publications and source records attributed to Bouet, N.
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The new NSLS-II deposition laboratory has been commissioned to include a variety of thin-film characterization equipment and a next-generation deposition system. The primary goal for this effort is R&D on the multilayer Laue lens (MLL), which is a new type of x-ray optic with the potential for an unprecedented level of x-ray nano-focusing. This unique deposition system contains many design features in order to facilitate growth of combined depth-graded and laterally graded multilayers with precise thickness control over many thousands of layers, providing total film growth in one run of up to 100 {micro}m thick or greater. A precision in-vacuum linear motor servo system raster scans a substrate over an array of magnetrons with shaped apertures at well-defined velocities to affect a multilayer coating. The design, commissioning, and performance metrics of the NSLS-II deposition system will be discussed. Latest growth results of both MLL and reflective multilayers in this machine will be presented.
Verification of the reliability of metrology data from high quality X-ray optics requires that adequate methods for test and calibration of the instruments be developed. For such verification for optical surface profilometers in the spatial frequency domain, a modulation transfer function (MTF) calibration method based on binary pseudo-random (BPR) gratings and arrays has been suggested [1] and [2] and proven to be an effective calibration method for a number of interferometric microscopes, a phase shifting Fizeau interferometer, and a scatterometer [5]. Here we describe the details of development of binary pseudo-random multilayer (BPRML) test samples suitable for characterization of scanning (SEM) and transmission (TEM) electron microscopes. We discuss the results of TEM measurements with the BPRML test samples fabricated from a WiSi2/Si multilayer coating with pseudo-randomly distributed layers. In particular, we demonstrate that significant information about the metrological reliability of the TEM measurements can be extracted even when the fundamental frequency of the BPRML sample is smaller than the Nyquist frequency of the measurements. The measurements demonstrate a number of problems related to the interpretation of the SEM and TEM data. Note that similar BPRML test samples can be used to characterize X-ray microscopes. Corresponding work with X-ray microscopes is in progress.