Charge Trap Layer Supercharging for Improved Bit Reliability in 3D NAND Flash Under Proton Irradiation
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Engineering topics
Publications and source records attributed to Breeding, Matthew Luel.
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Here this work shows that the static random access memory (SRAM) error rate for a commercial 65-nm device in a dose rate environment can be highly dependent upon the integrated dose (dose rate × pulse duration). While the typical metric for such testing is dose rate upset (DRU) level in rad(Si)/s, a series of dose rate experiments at Little Mountain Test Facility (LMTF) shows dependence on the integrated dose. The error rate is also found to be dependent on the core voltage, and the preradiation value of the bits. We believe that these effects are explained by a well charge depletion caused by gamma ray photocurrent.
Abstract not provided.