Pushing the limits: an instrument for hard X-ray imaging below 20 nm
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interferometry↗
Engineering topics
Conley, R
Publications and source records attributed to Conley, R.
Exotic X-ray Back-diffraction: a Path Toward a Soft Inelastic X-ray Scattering Spectrometer
N/A
Honnicke, M Goncalves↗
Observation of Two-Neutrino Double-Beta Decay in Xe-136 with EXO-200
We report the observation of two-neutrino double-beta decay in {sup 136}Xe with T{sub 1/2} = 2.11 {+-} 0.04(stat) {+-} 0.21(syst) x 10{sup 21} yr. This second-order process, predicted by the standard model, has been observed for several nuclei but not for {sup 136}Xe. The observed decay rate provides new input to matrix element calculations and to the search for the more interesting neutrinoless double-beta decay, the most sensitive probe for the existence of Majorana particles and the measurement of the neutrino mass scale.
72 PHYSICS OF ELEMENTARY PARTICLES AND FIELDS↗
Multilayer Laue Lens Growth at NSLS-II
The new NSLS-II deposition laboratory has been commissioned to include a variety of thin-film characterization equipment and a next-generation deposition system. The primary goal for this effort is R&D on the multilayer Laue lens (MLL), which is a new type of x-ray optic with the potential for an unprecedented level of x-ray nano-focusing. This unique deposition system contains many design features in order to facilitate growth of combined depth-graded and laterally graded multilayers with precise thickness control over many thousands of layers, providing total film growth in one run of up to 100 {micro}m thick or greater. A precision in-vacuum linear motor servo system raster scans a substrate over an array of magnetrons with shaped apertures at well-defined velocities to affect a multilayer coating. The design, commissioning, and performance metrics of the NSLS-II deposition system will be discussed. Latest growth results of both MLL and reflective multilayers in this machine will be presented.
36 MATERIALS SCIENCE↗
Characterization of Electron Microscopes with Binary Pseudo-random Multilayer Test Samples
Verification of the reliability of metrology data from high quality X-ray optics requires that adequate methods for test and calibration of the instruments be developed. For such verification for optical surface profilometers in the spatial frequency domain, a modulation transfer function (MTF) calibration method based on binary pseudo-random (BPR) gratings and arrays has been suggested [1] and [2] and proven to be an effective calibration method for a number of interferometric microscopes, a phase shifting Fizeau interferometer, and a scatterometer [5]. Here we describe the details of development of binary pseudo-random multilayer (BPRML) test samples suitable for characterization of scanning (SEM) and transmission (TEM) electron microscopes. We discuss the results of TEM measurements with the BPRML test samples fabricated from a WiSi2/Si multilayer coating with pseudo-randomly distributed layers. In particular, we demonstrate that significant information about the metrological reliability of the TEM measurements can be extracted even when the fundamental frequency of the BPRML sample is smaller than the Nyquist frequency of the measurements. The measurements demonstrate a number of problems related to the interpretation of the SEM and TEM data. Note that similar BPRML test samples can be used to characterize X-ray microscopes. Corresponding work with X-ray microscopes is in progress.
46 INSTRUMENTATION RELATED TO NUCLEAR SCIENCE AND ↗
Hard X-ray Nano Patterning using a Sectioned Multilayer
We report a hard x-ray patterning capable of drawing lines with a width below 100 nm using x-rays at 0.165 nm. A specially prepared mask based on multilayer growth technology was used as an x-ray mask effectively. The x-ray Talbot effect in near field was investigated and utilized in the patterning. Since multilayers with a few nanometer layer spacing are readily available, the proposed hard x-ray nano patterning, free of the limit imposed by the Rayleigh criterion in optical range, can potentially be an ultimate optical lithography technique.
71 CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSIC↗
Characterization of Large Area APDs for the EXO-200 Detector
EXO-200 uses 468 large area avalanche photodiodes (LAAPDs) for detection of scintillation light in an ultra-low-background liquid xenon (LXe) detector. We describe initial measurements of dark noise, gain and response to xenon scintillation light of LAAPDs at temperatures from room temperature to 169 K - the temperature of liquid xenon. We also describe the individual characterization of more than 800 LAAPDs for selective installation in the EXO-200 detector.
71 CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSIC↗