Engineering topics

Echternach, Pierre M.

Publications and source records attributed to Echternach, Pierre M..

5 records

NASA NTRS2010

The JWST/NIRCam Coronagraph Flight Occulters

The NIRCam instrument on the James Webb Space Telescope will have a Lyot coronagraph for high contrast imaging of extrasolar planets and circumstellar disks at lambda = 2 - 5 micrometers. Half-tone patterns are used to create graded-transmission image plane masks. These are generated using electron beam lithography and reactive ion etching of a metal layer on an antireflection coated sapphire substrate. We report here on the manufacture and evaluation of the flight occulters.

extrasolar planets↗

NASA NTRS2009

The JWST/NIRCam Coronagraph: Mask Design and Fabrication

The NIRCam instrument on the James Webb Space Telescope will provide coronagraphic imaging from lambda =1-5 microns of high contrast sources such as extrasolar planets and circumstellar disks. A Lyot coronagraph with a variety of circular and wedge-shaped occulting masks and matching Lyot pupil stops will be implemented. The occulters approximate grayscale transmission profiles using halftone binary patterns comprising wavelength-sized metal dots on anti-reflection coated sapphire substrates. The mask patterns are being created in the Micro Devices Laboratory at the Jet Propulsion Laboratory using electron beam lithography. Samples of these occulters have been successfully evaluated in a coronagraphic testbed. In a separate process, the complex apertures that form the Lyot stops will be deposited onto optical wedges. The NIRCam coronagraph flight components are expected to be completed this year.

Coronagraph↗

NASA NTRS2006

Fabrication and Characteristics of Free Standing Shaped Pupil Masks for TPF-Coronagraph

Direct imaging and characterization of exo-solar terrestrial planets require coronagraphic instruments capable of suppressing star light to 10-10. Pupil shaping masks have been proposed and designed1 at Princeton University to accomplish such a goal. Based on Princeton designs, free standing (without a substrate) silicon masks have been fabricated with lithographic and deep etching techniques. In this paper, we discuss the fabrication of such masks and present their physical and optical characteristics in relevance to their performance over the visible to near IR bandwidth.

terrestrial planet finder↗

NASA NTRS2005

Occulting focal plane masks for Terrestrial Planet Finder Coronagraph: design, fabrication, simulations and test results

Occulting focal plane masks for the Terrestrial Planet Finder Coronagraph (TPF-C) could be designed with continuous gray scale profile of the occulting pattern such as 1-sinc2 on a suitable material or with micron-scale binary transparent and opaque structures of metallic pattern on glass. We have designed, fabricated and tested both kinds of masks. The fundamental characteristics of such masks and initial test results from the High Contrast Imaging Test bed (HCIT) at JPL are presented.

adaptive optics↗

NASA NTRS2005

Electron-beam lithography for micro and nano-optical applications

Direct-write electron-beam lithography has proven to be a powerful technique for fabricating a variety of micro- and nano-optical devices. Binary E-beam lithography is the workhorse technique for fabricating optical devices that require complicated precision nano-scale features. We describe a bi-layer resist system and virtual-mark height measurement for improving the reliability of fabricating binary patterns. Analog E-beam lithography is a newer technique that has found significant application in the fabrication of diffractive optical elements. We describe our techniques for fabricating analog surface-relief profiles in E-beam resist, including some discussion regarding overcoming the problems of resist heating and charging. We also describe a multiple-field-size exposure scheme for suppression of field-stitch induced ghost diffraction orders produced by blazed diffraction gratings on non-flat substrates.

electron-beam lithography↗