Engineering topics

Feigenbaum, Eyal

Publications and source records attributed to Feigenbaum, Eyal.

At least 19 records

DOE OSTI2024

System and method for parallel two-photon lithography using a metalens array

A metalens array is disclosed for controllably modifying a phase of a wavefront of an optical beam. The metalens array may have a substrate having at least first and second metalens unit cells, and forming a single integrated structure with no stitching being required of the first and second metalens unit cells. The first metalens unit cell has a first plurality of nanoscale features and is configured to modify a phase of a first portion of a wavefront of an optical signal incident thereon in accordance with a first predetermined phase pattern to create at least one first focal voxel within an image plane. The second metalens unit cell has a second plurality of nanoscale features configured to modify the phase of a second portion of the wavefront of the optical signal incident thereon, in accordance with a second predetermined phase pattern, to simultaneously create at least one second focal voxel within the image plane. Each metalens unit cell also has an overall diameter of no more than about 200 microns.

Xia, Xiaoxing↗

DOE OSTI2024

System and method for using mechanical loading to create spatially patterned meta surfaces for optical components

The present disclosure relates to a system for producing a patterned nanostructured surface on a component from a pre-existing, nanostructured surface with a first spatial feature distribution on the component. The system makes use of a force application element configured to apply a force to the pre-existing, nanostructured surface, and a force application control subsystem. The force application control subsystem is configured to control elevational movement of the force application element along a first axis of movement into and out of contact with the pre-existing, nanostructured surface to apply a predetermined load to the pre-existing, nanostructured surface. The predetermined load is sufficient to modify the pre-existing, non-patterned nanostructured surface to create the patterned nanostructured surface.

Ray, Nathan James↗

DOE OSTI2024

Laser micro-machining and damage testing of rounded shadow cone blockers on silica glass for arresting laser damage growth by redirection of light

Structured conical blockers manufactured on optical input surfaces are being used to shadow, and thereby, arrest growth of exit surface damage on large optics for applications in high-energy laser systems to extend their lifetime usage. However, as the size of the Shadow Cone Blocker (SCB) is increased, the deflected light must be carefully managed to prevent consequential damage from downstream intensification. Here, we design and fabricate a distinct input SCB geometry to alleviate this problem, enabling larger damage site mitigation. The demonstrated ~1 mm diameter SCB was manufactured with a convergent approach using a CO 2 pulsed laser ablative scanning sequence on a fused silica window. The SCB design was refined to maximize resistance to both input and exit surface damage initiations on 1 cm thick fused silica windows when exposed to 351 nm irradiation and validated with laser damage testing. The design showed to prevent damage onset to the exit surface for incident fluences on the SCB of 10.7 ± 1.3 J·cm -2 and is resistant to damage on the input surface exceeding 30 J·cm -2 input fluence.

36 MATERIALS SCIENCE↗

DOE OSTI2023

Enhanced laser-induced damage performance of all-glass metasurfaces for energetic pulsed laser applications

To fabricate optical components with surface layers compatible with high power laser applications that may operate as antireflective coatings, polarization rotators, or harness physical anisotropy for other uses, metasurfaces are becoming an appealing candidate. In this study, a large-beam (1.05 cm diameter) 351-nm laser-induced damage testing was done on an all-glass metasurface structure composed of cone-like features with a subwavelength spacing of adjacent features. These structures were fabricated on untreated fused silica glass and damage tested, as were structures that were fabricated on fused silica glass that experienced a preliminary etching process to remove the surface Beilby layer that is characteristic of polished fused silica. The laser-induced damage onset for structures on untreated fused silica glass was 19.3 J∙cm -2 , while the sample that saw an initial pretreatment etch exhibited an improved damage onset of 20.4 J∙cm -2 , only 6% short of the reference pretreated glass damage onset of 21.7 J∙cm -2 . For perspective, the National Ignition Facility (NIF) operational average fluence at this wavelength and pulse length is about 10 J/cm2. At a fluence of 25.5 J∙cm -2 , the reference (pretreated) fused silica initiated 5.2 damage sites per mm 2 , while the antireflective metasurface sample with a preliminary etching process treatment initiated 9.8 damage sites per mm 2 . In conclusion, these findings demonstrate that substrate-engraved metasurfaces are compatible with high energy and power laser applications, further broadening their application space.

36 MATERIALS SCIENCE↗

DOE OSTI2023

Birefringent waveplate and method for forming a waveplate having a birefringent metasurface

The present disclosure relates to a waveplate having a substrate forming an optic. The substrate may have an integral portion forming a plurality of angled columnar features on an exposed surface thereof. The plurality of angled columnar features may further be aligned parallel with a directional plane formed non-parallel to a reference plane, with the reference plane being normal to a surface of the substrate. The metasurface forms a birefringent metasurface.

Feigenbaum, Eyal↗

DOE OSTI2023

Birefringent Glass‐Engraved Tilted Pillar Metasurfaces for High Power Laser Applications

Abstract Birefringent materials—which are highly needed in high power laser systems—may be limited in usage due to the laser‐induced damage threshold of traditional birefringent materials. This work reports here on all‐glass metasurfaces, fabricated by angled etching through sacrificial metal nanoparticle (NP) etching masks, for generation of effective birefringence in the formed layer. As a result, a fused silica metasurface, monolithic to the underlying substrate, is demonstrated to exhibit a birefringence of 6.57° under 375 nm illumination. Full‐wave analysis shows a good agreement with the measurement and presents potential paths forward to increasing the effective metasurface birefringence. This is the first demonstration, to the best of knowledge, of an etching technique to obtain the resulting tilted pillar‐like nanofeatures. The anisotropy of the metasurface nanoelements along the two window in‐plane major axes presents different effective paths for the two polarizations and thus generates birefringence in a nonbirefringent material. Additionally, the imparted anisotropy lends itself to manipulation of physical properties of the surface as well, with metasurface feature orientation suppressing water flow along one principal axis and giving rise to water flow steering capabilities.

36 MATERIALS SCIENCE↗

DOE OSTI2023

Fast image acquisition system and method using pulsed light illumination and sample scanning to capture optical micrographs with sub-micron features

An optical inspection system for detecting sub-micron features on a sample component. The system may have a controller, a camera responsive to the controller for capturing images, an objective lens able to capture submicron scale features on the sample component, and a pulsed light source. The pulsed light source may be used to generate light pulses. The camera may be controlled to acquire images, using the objective lens, only while the pulsed light source is providing light pulses illuminating a portion of the sample component. Relative movement between the sample component and the objective lens is provided to enable at least one of a desired subportion or an entirety of the sample component to be scanned with the camera.

Yoo, Jae Hyuck↗

DOE OSTI2023

All-Glass Metasurfaces for Ultra-Broadband and Large Acceptance Angle Antireflectivity: from Ultraviolet to Mid-Infrared

For many optics technologies, such as display screens, solar cells, laser systems, and eyeglasses, antireflective (AR) coatings are well integrated; these applications frequently benefit from the ability to function as broadband AR. Here, in this work, all-glass metasurfaces are reported on, exhibiting a measured reflectance of 0.18% ± 0.23% per interface, averaged across wavelengths spanning from 350 nm (ultraviolet) to 2350 nm (mid-infrared); to the best of knowledge, this is the first-ever demonstration of an AR layer capable of this. Furthermore, acceptance angles up to 100° (angle of incidence = ±50°) results in % R < 0.6% per interface over the band 350–1300 nm for P-polarization and S-polarization, with wavelength averaged reflectance values 0.04% ± 0.05% and 0.11% ± 0.15%, respectively – another technological first. The process advancements presented here allow for reflectance suppression over a broad range of wavelengths, angles, and polarizations.

36 MATERIALS SCIENCE↗

DOE OSTI2022

Temporal and spatial laser intensification within nodular defects overcoated with multilayer dielectric mirrors over a wide range of defect geometries

The nodular defect shape and the laser incidence angle have a dramatic impact on the spatial distribution of light intensification within the nodule as well as how the laser light is drained from the defect. Nodular defect geometries unique to ion beam sputtering, ion-assisted deposition, and electron-beam (e-beam) deposition, respectively, are modeled in this parametric study over a wide range of nodular inclusion diameters and layer count for optical interference mirror coatings constructed with quarter-wave thicknesses and capped with a half wave of the low index material. It was found for hafnia ($n$=1.9) and silica ($n$=1.45) multilayer mirrors that the light intensification in nodular defects with a $C$ factor of 8, typical of e-beam deposited coatings deposited with a wide range of deposition angles, was maximized for a 24-layer design. For intermediate size inclusion diameters, increasing the layer count for normal incidence multilayer mirrors reduced the light intensification within the nodular defect. A second parametric study explored the impact of the nodule shape on the light intensification for a fixed number of layers. In this case, there is a strong temporal trend for the different nodule shapes. Narrow nodules tend to drain more laser energy through the bottom of the nodule into the substrate while wide nodules tend to drain more laser energy through the top of the nodule when irradiated at normal incidence. Further, at a 45° incidence angle, waveguiding is an additional method to drain laser energy from the nodular defect. Finally, laser light resonates within nodular defects longer than within the adjacent nondefective multilayer structure.

47 OTHER INSTRUMENTATION↗

DOE OSTI2022

System and method for ablation assisted nanostructure formation for graded index surfaces for optics

A system and method is disclosed for forming a graded index (GRIN) on a substrate. In one implementation the method may involve applying a metal layer to the substrate. A fluence profile of optical energy applied to the metal layer may be controlled to substantially ablate the metal layer to create a vaporized metal layer. The fluence profile may be further controlled to control a size of metal nanoparticles created from the vaporized metal layer as the vaporized metal layer condenses and forms metal nanoparticles, the metal nanoparticles being deposited back on the substrate to form a GRIN surface on the substrate.

Yoo, Jae Hyuck↗

DOE OSTI2022

System and method for plasmonic control of short pulses in optical fibers

The present disclosure relates to an optical waveguide system. The system has a first waveguide having a core-guide and a cladding material portion surrounding and encasing the core-guide to form a substantially D-shaped cross sectional profile with an exposed flat section running along a length thereof. The core-guide enables a core-guide mode for an optical pulse signal having a first characteristic, travelling through the core-guide. A material layer of non-linear material is used which forms a second waveguide. The material layer is disposed on the exposed flat section of the cladding material portion. The material layer forms a plasmonic device to achieve a desired coupling with the core-guide to couple optical energy travelling through the core-guide into the material layer to modify the optical energy travelling through the core-guide such that the optical energy travelling through the core-guide has a second characteristic different from the first characteristic.

Feigenbaum, Eyal↗

DOE OSTI2022

Designer Metasurfaces for Antireflective Applications Enabled by Advanced Nanoparticle Technology

Optic processing advances have shifted system limitations, with current constraints consisting of antireflective (AR) coatings applied to optics and the inability to reduce size, weight, and price. Metasurfaces, and more broadly metaoptics, provide an avenue to overcome these limitations. The ability to generate substrate-engraved metasurfaces that can be tailored is demonstrated within a broad design space to satisfy large-area AR applications for bandpass or broadband needs, demonstrating an optically equivalent surface roughness standard deviation of only 5 Å. Using an advanced nanoparticle masking approach, two metasurfaces are fabricated: 1) vertical sidewall nanofeature metasurface (MS) for AR applications at 351 nm, and 2) sloped sidewall MS designed for broadband AR applications. For the 351 nm MS, the reflectance is measured to be 0.127%. In the case of the sloped sidewall MS, the reflectance is measured to be <0.25% over 400–700 nm and <1% over 400–1100 nm. To the best of the authors’ knowledge, this is the first demonstration of a broadband AR capable of this performance. The tunability of these structures, with a parameter space spanning even more remarkable designs such as broader bands and acceptance angles, coupled with high laser-induced damage durability and mechanical robustness, displays the strength of metasurfaces for AR applications.

36 MATERIALS SCIENCE↗

DOE OSTI2022

System and method for repeated metal deposition-dewetting steps to form a nano-particle etching mask producing thicker layer of engraved metasurface

A method and system is disclosed for creating an optical component having a spatially controlled refractive index and uniform anti-reflective layer. The method may involve alternately depositing and dewetting two or more thin metal material layers on the substrate to form a mask having a spatially varying nano-particle distribution, and with an increased thickness beyond what could be achieved using a single, thick layer of the same material. The substrate may then be etched, using the mask, to imprint a spatially patterned nanostructure pattern on a surface the substrate in accordance with the mask.

Feigenbaum, Eyal↗

DOE OSTI2021

Fused silica optics damage from downstream intensification on laser-induced damage precursors

Management and control of damage initiation and growth on high-value National Ignition Facility (NIF) optics are critical to its operation. Cone-shaped features are currently being used on the input surfaces to arrest growth of exit surface damage by creating “shadows.” Light refracted from the walls of the cones interferes with the incident beam at the exit surface to create an intensified annulus. Significant exit surface damage was observed at the locations of these annuli. Analysis showed that this damage is consistent with a recently reported new mechanism that degrades damage resistance by dispersing damage precursors over the surface upon exposure to UV laser radiation. This has significant implications for the design and operation of high-energy and power laser systems such as the NIF.

47 OTHER INSTRUMENTATION↗

DOE OSTI2021

Large aperture and durable glass-engraved optical metasurfaces using nanoparticle etching masks: prospects and future directions

Abstract Metasurfaces (MSs), or surfaces consisting of engineered spatially oriented sub-wavelength elements—also known as meta-atoms—are quickly becoming a burgeoning field of interest due to their seemingly unparalleled control over the propagation of light. This article will discuss the emergence of a MS technology that is based on dewetting thin metal films to form dry etching masks for MS fabrication. The novelty this process presents is the ability to spatially vary mask features—which translates into spatially varying index of the finished surface—in a way that, rather than writing subwavelength elements one-by-one, writes entire areas at once to provide a route to easily scale the process up to meter-sized optics. Glass-engraved MSs have shown to be laser damage resistant, with damage thresholds close to the parent substrate damage thresholds. Furthermore, these surfaces have proven to be mechanically durable and capable of handling normal loads two orders of magnitude higher than that of an average fingerprint pressure. This indicates that accidental handling contact is not detrimental to the MS optical performance. Also discussed are the foreseeable technological challenges, potential solutions for those obstacles, and some currently unexplored directions for future efforts.

47 OTHER INSTRUMENTATION↗

DOE OSTI2021

System and method for focal-plane illuminator/detector (FASID) design for improved graded index lenses

The present disclosure relates to a detector system for imaging an optical signal received by a graded index (GRIN) optical element to account for known variations in a graded index distribution of the GRIN optical element. The detector system incorporates a plurality of optical detector elements configured to receive optical rays received by the GRIN optical element at specific locations on a plane of the GRIN optical element. Ray tracing software is configured to receive and map the optical rays to a plurality of additional specific locations on the plane based on the known variations in the graded index distribution of the GRIN optical element. A processor uses algorithms for diagonalization of a linear system matrix to determine information on both an intensity and an angle of the received optical rays at each one of the plurality of specific locations on the plane.

Bude, Jeffrey Devin↗

DOE OSTI2021

Tuning Gold Nanoparticle Size with Fixed Interparticle Spacing in Large-Scale Arrays: Implications for Plasmonics and Nanoparticle Etching Masks

Gold nanoparticles play an important role in plasmonic arrays, including, but not limited to, photovoltaic, biomedical, sensing, optical, and catalytic applications. For plasmonic arrays, control over spatial variables of the array, such as nanoparticle size and spacing, must be judiciously cared for. In this work, we present here a multistep deposit/dewet process for nanoparticle ensemble fabrication that exploits thermally driven solid-state diffusional dewetting, coupled with Ostwald ripening, to tune the nanoparticle size or area coverage for a particular particle–particle spacing. The initial dewetting process defines the spatial period of the array, with subsequent dewetting steps growing the nanoparticles while adhering to the “seeded” period from the first dewetting. Following the fifth deposit/dewet cycle, relative to the first cycle, the mean nanoparticle height exhibited a percent increase of 90 and 66% for 5 and 7.5 nm multistep deposit/dewet processes, respectively, while minimally impacting the ensemble period. This provides unprecedented control over the spatial parameters of large-scale nanoparticle ensembles for plasmonic and etching-mask applications where a particular particle size and spacing are desired. Due to the simplicity of the technique and its area scalability, the cyclic deposition/dewetting process is shown here to be a method that can be easily scaled up to apply to large-area (up to meter-size) applications.

36 MATERIALS SCIENCE↗

DOE OSTI2020

Coupling buried etalon layers to an engraved metasurface for durable and large-aperture meta-optics

Many optical applications that could potentially benefit from the design flexibility provided by the metasurface approach are being prohibited by the limited scalability of the fabrication and the robustness of the end-result structures when using a resonant meta-elements-based approach. In this study, an alternative demonstrated approach with superior scalability and robustness is substrate-engraved metasurfaces, based on medium mixing homogenization, yet it suffers from very limited optical response. Here we propose advancing this approach by coupling the metasurface with buried etalon layers, leading to enhancement in the optical response. A transfer matrix analysis is used to study the parameter space, predicting that the patterned reflectance values range of a beam shaper could be raised from only 4% to 30% when the metasurface is engraved in silica, and even up to 66% when engraved into higher-index oxides. Using the method proposed here, the phase difference range across the metasurface could be increased by 0.4 radians beyond the range achievable by a metasurface engraved in silica and could reach even higher values when embedded in higher-index materials. Full-wave numerical simulations are used to demonstrate a cylindrical metareflector and a metalens, further validating the analysis.

47 OTHER INSTRUMENTATION↗