Dual-wavelength laser-induced damage threshold of a HfO2/SiO2 dichroic coating developed for high transmission at 527 nm and high reflection at 1054 nm.
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Engineering topics
Publications and source records attributed to Field, Ella Suzanne.
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The laser damage thresholds of optical coatings can degrade over time due to a variety of factors, including contamination and aging. Optical coatings deposited using electron beam evaporation are particularly susceptible to degradation due to their porous structure. In a previous study, the laser damage thresholds of optical coatings were reduced by roughly a factor of two from 2013 to 2017. The coatings in question were high reflectors for 1054 nm that contained SiO 2 and HfO 2 and/or TiO 2 layers, and they were stored in sealed PETG containers in a class 100 cleanroom with temperature control. At the time, it was not certain whether contamination or thin film aging effects were responsible for the reduced laser damage thresholds. Therefore, to better understand the role of contamination, the coatings were recleaned and the laser damage thresholds were measured again in 2018. Here, the results indicate that contamination played the most dominant role in reducing the laser damage thresholds of these optical coatings, even though they were stored in an environment that was presumed to be clean.
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Existing models for most materials do not describe phase transformations and associated lattice dy- namics (kinetics) under extreme conditions of pressure and temperature. Dynamic x-ray diffraction (DXRD) allows material investigations in situ on an atomic scale due to the correlation between solid-state structures and their associated diffraction patterns. In this LDRD project we have devel- oped a nanosecond laser-compression and picosecond-to-nanosecond x-ray diffraction platform for dynamically-compressed material studies. A new target chamber in the Target Bay in building 983 was commissioned for the ns, kJ Z-Beamlet laser (ZBL) and the 0.1 ns, 250 J Z-Petawatt (ZPW) laser systems, which were used to create 8-16 keV plasma x-ray sources from thin metal foils. The 5 ns, 15 J Chaco laser system was converted to a high-energy laser shock driver to load material samples to GPa stresses. Since laser-to-x-ray energy conversion efficiency above 10 keV is low, we employed polycapillary x-ray lenses for a 100-fold fluence increase compared to a conventional pinhole aperture while simultaneously reducing the background significantly. Polycapillary lenses enabled diffraction measurements up to 16 keV with ZBL as well as diffraction experiments with ZPW. This x-ray diffraction platform supports experiments that are complementary to gas guns and the Z facility due to different strain rates. Ultimately, there is now a foundation to evaluate DXRD techniques and detectors in-house before transferring the technology to Z. This page intentionally left blank.
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