Engineering topics
Publications and source records attributed to Ghosh, Vinita.
Beamlines are required to shield against two primary sources of radiation, the primary gas bremsstrahlung (GB) and the synchrotron beam, as well as the secondary radiation resulting from the scattering of these two primary beams by the beamline components and/or air.
The NSLS-II BEAMLINE RADIATION SHIELDING POLICY has been stated as follows in reference 1: Radiation exposure to staff and users resulting from National Synchrotron Light Source II (NSLS-II) operations must comply with Brookhaven National Laboratory (BNL) and Department of Energy (DOE) radiation requirements and must be maintained as low as reasonably achievable (ALARA).
The NSLS-II BEAMLINE RADIATION SHIELDING POLICY has been stated as follows in reference 1: Radiation exposure to staff and users resulting from National Synchrotron Light Source II (NSLS-II) operations must comply with Brookhaven National Laboratory (BNL) and Department of Energy (DOE) radiation requirements and must be maintained as low as reasonably achievable (ALARA). Per the NSLS-II Shielding Policy (PS-C-ASD-POL-005), in continuously occupied areas during normal operation the dose rate is ALARA, and shall be < 0.5 mrem/h (based on occupancy of 2000 hours/year) or less than 1 rem in a year.
The NSLS-II BEAMLINE RADIATION SHIELDING POLICY has been stated as follows in reference 1: Radiation exposure to staff and users resulting from National Synchrotron Light Source II (NSLS-II) operations must comply with Brookhaven National Laboratory (BNL) and Department of Energy (DOE) radiation requirements and must be maintained as low as reasonably achievable (ALARA). Per the Photon Science Shielding Policy (PS-C-ASD-POL-005), in continuously occupied areas during normal operation the dose rate is ALARA, and shall be < 0.5 mrem/h (based on occupancy of 2000 hours/year) or less than 1 rem in a year.
A multi-laboratory ontology construction effort during the summer and fall of 2009 prototyped an ontology for counterfeit semiconductor manufacturing. This effort included an ontology development team and an ontology validation methods team. Here the third team of the Ontology Project, the Data Analysis (DA) team reports on their approaches, the tools they used, and results for mining literature for terminology pertinent to counterfeit semiconductor manufacturing. A discussion of the value of ontology-based analysis is presented, with insights drawn from other ontology-based methods regularly used in the analysis of genomic experiments. Finally, suggestions for future work are offered.