Stability of Conducting Amorphous Ru-Si-O Thin Films Under Oxygen Annealing
Ru(sub 1)Si(sub 1)O(sub 4) thin films were deposited on Si and oxidized Si substrates by reactive rf magnetron sputtering of a Ru(sub 1)Si(sub 1) target in an argon/oxygen gas mixture.
thin film amorphous ternary oxide crystallization ↗