Engineering topics

Goela, Jitendra S.

Publications and source records attributed to Goela, Jitendra S..

10 records

NASA NTRS1992

Method of fabricating lightweight honeycomb structures

A process is disclosed for fabricating lightweight honeycomb type structures out of material such as silicon carbide (SiC) and silicon (S). The lightweight structure consists of a core to define the shape and size of the structure. The core is coated with an appropriate deposit such as SiC or Si to give the lightweight structure strength and stiffness and for bonding the lightweight structure to another surface. The core is fabricated from extremely thin ribs of appropriately stiff and strong material such as graphite. First, a graphite core consisting of an outer hexagonal cell with six inner triangular cells is constructed from the graphite ribs. The graphite core may be placed on the back-up side of a SiC faceplate and then coated with SiC to produce a monolithic structure without the use of any bonding agent. Cores and methods for the fabrication thereof in which the six inner triangular cells are further divided into a plurality of cells are also disclosed.

Goela, Jitendra S.↗

NASA NTRS1992

Effect of process conditions and chemical composition on the microstructure and properties of chemically vapor deposited SiC, Si, ZnSe, ZnS and ZnS(x)Se(1-x)

Subatmospheric pressure CVD processes have been developed to produce theoretically dense, highly pure, void-free and large area bulk materials, SiC, Si, ZnSe, ZnS and ZnS(x)Se(1-x). These materials are used for optical elements, such as mirrors, lenses and windows, over a wide spectral range from the VUV to the IR. We discuss the effect of CVD process conditions on the microstructure and properties of these materials, with emphasis on optical performance. In addition, we discuss the effect of chemical composition on the properties of the composite material ZnS(x)Se(1-x). We first present a general overview of the bulk CVD process and the relationship between process conditions, such as temperature, pressure, reactant gas concentration and growth rate, and the microstructure, morphology and properties of CVD-grown materials. Then we discuss specific results for CVD-grown SiC, Si, ZnSe, ZnS and ZnS(x)Se(1-x).

Pickering, Michael A.↗

NASA NTRS1991

Fabrication of lightweight ceramic mirrors by means of a chemical vapor deposition process

A process to fabricate lightweigth ceramic mirrors, and in particular, silicon/silicon carbide mirrors, involves three chemical vapor deposition steps: one to produce the mirror faceplate, the second to form the lightweight backstructure which is deposited integral to the faceplate, and the third and final step which results in the deposition of a layer of optical grade material, for example, silicon, onto the front surface of the faceplate. The mirror figure and finish are fabricated into this latter material.

Goela, Jitendra S.↗

NASA NTRS1991

Fabrication of lightweight Si/SiC LIDAR mirrors

A new, chemical vapor deposition (CVD) process was developed for fabricating lightweight, polycrystalline silicon/silicon-carbide (Si/SiC) mirrors. The process involves three CVD steps: (1) to produce the mirror faceplate; (2) to form the lightweight backstructure, which is deposited integral to the faceplate; and (3) to deposit a layer of optical-grade material, e.g., Si, onto the front surface of the faceplate. The mirror figure and finish are fabricated into the faceplate.

Goela, Jitendra S.↗

NASA NTRS1991

Fabrication Of Lightweight Mirrors Via CVD

New chemical-vapor deposition (CVD) process developed for fabricating lightweight Si/SiC mirrors. Process involves three CVD steps: to produce faceplate of mirror; to form lightweight back structure deposited integrally with faceplate; and to deposit layer of optical-grade material onto front surface of faceplate. Figure and finish of mirror fabricated into this latter material. Produces dense, highly pure polycrystalline materials polished to surface figures of high precision and finish.

Goela, Jitendra S.↗

NASA NTRS1991

Preventing Vapor Deposition Of The Backs Of Substrates

Technique prevents back-side deposition on substrates in impinging chemical-vapor deposition (CVD) system developed. Applied in selective deposition of silicon on silicon carbide. Inexpensive, does not require any machining to remove excess material, and easy to use. Used successfully in selective depostion of SiC and Si in CVD reactor.

Goela, Jitendra S.↗

NASA NTRS1990

Making Lightweight Structures By Vapor Deposition

Technique developed for fabrication of stiff, strong, lightweight structures of silicon carbide or other materials by any of several deposition processes. Structures made by method can have complicated shapes. Ability to manufacture complex shape from pure deposited SiC useful and leads to new products in several fields. These lightweight structures used as backup structures for optical components, as structural components in automotive, aerospace, and outer space applications, and as lightweight parts of furniture for outer space.

Goela, Jitendra S.↗

NASA NTRS1989

Chemical vapor deposition for silicon cladding on advanced ceramics

Polycrystalline Si was used to clad several advanced ceramic materials such as SiC, Si3N4, sapphire Al2O3, pyrolytic BN, and Si by a CVD process. The thickness of Si cladding ranged from 0.025 to 3.0 mm. CVD Si adhered quite well to all the above materials except Al3O, where the Si cladding was highly stressed and cracked or delaminated. A detailed material characterization of Si-clad SiC samples showed that Si adherence to SiC does not depend much on the substrate surface preparation; that the thermal cycling and polishing of the samples do not cause delamination; and that, in four-point bend tests, the Si-SiC bond remains intact, with the failure occurring in the Si.

Goela, Jitendra S.↗

NASA NTRS1989

Rapid fabrication of lightweight ceramic mirrors via chemical vapor deposition

Lightweight Si/SiC mirrors of nominal diameter 7.5 cm have been fabricated via a scalable and rapid CVD process to demonstrate the CVD mirror fabrication technology. These mirrors consist of a faceplate of either Si or Si-coated SiC and a lightweight backstructure made of either Si or SiC. The mirrors were polished to a figure better than 1/5th of a wave at 0.6328 A and a finish of better than 10 A rms. A procedure for fabricating these mirrors is described. The CVD fabrication process is fast and has the potential to yield several mirrors in a few weeks time from a single reactor. The CVD mirror fabrication technology is quite general and can be extended to include mirrors of other ceramic materials such as TiB2 and B4C.

Goela, Jitendra S.↗

NASA NTRS1989

Fabrication of light-weighted Si/SiC lidar mirrors

Small models of lightweight Si/SiC lidar mirrors have been fabricated via a scalable and cost-effective chemical vapor deposition (CVD) process. These mirrors are about 7.5 cm in diameter and consist of a Si-cladded SiC faceplate and lightweight structure made of SiC. The lightweight structure consists of an outer hexagonal cell with six triangular inner cells. The mirrors were polished to a figure better than 1/5 of a wave and a finish of better than 5A rms. The CVD route to fabrication of mirrors is fast and has the potential to yield several mirrors in a few weeks time from a signel reactor.

Goela, Jitendra S.↗