Engineering topics

Golding, T. D.

Publications and source records attributed to Golding, T. D..

3 records

DOE OSTI2015

Improved performance in GaInNAs solar cells by hydrogen passivation

The effect of UV-activated hydrogenation on the performance of GaInNAs solar cells is presented. A proof-of-principle investigation was performed on non-optimum GaInNAs cells, which allowed a clearer investigation of the role of passivation on the intrinsic nitrogen-related defects in these materials. Upon optimized hydrogenation of GaInNAs, a significant reduction in the presence of defect and impurity based luminescence is observed as compared to that of unpassivated reference material. This improvement in the optical properties is directly transferred to an improved performance in solar cell operation, with a more than two-fold improvement in the external quantum efficiency and short circuit current density upon hydrogenation. Temperature dependent photovoltaic measurements indicate a strong contribution of carrier localization and detrapping processes, with non-radiative processes dominating in the reference materials, and evidence for additional strong radiative losses in the hydrogenated solar cells.

75 CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND↗

DOE OSTI2013

Defect mitigation by ion induced amorphousization and solid-phase epitaxy

Ion implantation is a common technique in the semiconductor industry used to modify the electrical properties of materials, usually silicon. Some dopant ions are sufficiently light, such as boron, that they do not create a continuous amorphous layer in silicon over the range of the ions. In the presence of such a layer, most of the ioninduced damage can be removed by solid-phase epitaxy growth (SPEG), which results in recrystallization of the amorphous damage. However, end-of-range defects at the amorphous-crystal interface give rise to threading dislocations during SPEG that degrade the quality of the recrytallized Si. We have studied the end of range defects in silicon with three different implantations. The first was with 80 keV {sup 30}Si with a dose of 3 Multiplication-Sign 10{sup 15} Si/cm{sup 2}, and the second was with 100 keV {sup 72}Ge at a dose of 1 Multiplication-Sign 10{sup 15} Ge/cm{sup 2}, and the third was a double implant of 100 keV {sup 72}Ge at a dose of 1 Multiplication-Sign 10{sup 15} Ge/cm{sup 2} followed by 340 keV {sup 28}Si at a dose of 3 Multiplication-Sign 10{sup 14} Si/cm{sup 2}. SPEG was done at 650 Degree-Sign C to recrystalize the implanted samples, and the end of range defects were studied using channeled Rutherford Backscattering Spectrometry (RBS-c). The effects of photon-assisted hydrogenation on amorphization and recrystallization were also studied.

36 MATERIALS SCIENCE↗

NASA NTRS1992

Reflection high-energy electron diffraction study of growth and interface formation of the Ga(1-x)In(x)Sb/InAs strained-layer superlattices

Reflection high-energy electron diffraction (RHEED) during molecular beam epitaxy is used to study the growth and interface formation of the Ga(1-x)In(x)Sb/InAs (x is not greater than 0.4) strained-layer superlattices (SLSs) on GaSb(100) substrates. A number of surface atomic structures were observed in the growth of the SLS: a (1 x 3) phase from the InAs epilayer surface, a (2 x 3) phase, a (2 x 4) phase, and diffuse (1 x 1)-like phases from the InAs epilayer surface. It is suggested that the long-range order quality of the interface of Ga(1-x)In(x)Sb on InAs may be better than that of the interface of InAs on Ga(1-x)In(x)Sb, but the abruptness of the interfaces would still be compatible. The RHEED intensity variations in the formation of the interfaces are discussed in terms of interface chemical reactions.

Fan, W. C.↗