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Golub, Morton A.

Publications and source records attributed to Golub, Morton A..

At least 19 records
All sourcesNASA NTRSDOE OSTI
NASA NTRS1998

Fluoropolymer Films Deposited by Argon Ion-Beam Sputtering of Polytetrafluoroethylene

The FT-IR, XPS and UV spectra of fluoropolymer films (SPTFE-I) deposited by argon ion-beam sputtering of polytetrafluoroethylene (PTFE) were obtained and compared with prior corresponding spectra of fluoropolymer films (SPTFE-P) deposited by argon rf plasma sputtering of PTFE. Although the F/C ratios for SPTFE-I and -P (1.63 and 1.51) were similar, their structures were quite different in that there was a much higher concentration of CF2 groups in SPTFE-I than in SPTFE-P, ca. 61 and 33% of the total carbon contents, respectively. The FT-IR spectra reflect that difference, that for SPTFE-I showing a distinct doublet at 1210 and 1150 per centimeter while that for SPTFE-P presents a broad, featureless band at ca. 1250 per centimeter. The absorbance of the 1210-per centimeter band in SPTFE-I was proportional to the thickness of the film, in the range of 50-400 nanometers. The SPTFE-I was more transparent in the UV than SPTFE-P at comparable thickness. The mechanism for SPTFE-I formation likely involves "chopping off" of oligomeric segments of PTFE as an accompaniment to "plasma" polymerization of TFE monomer or other fluorocarbon fragments generated in situ from PTFE on impact with energetic Ar ions. Data are presented for SPTFE-I deposits and the associated Ar(+) bombarded PTFE targets where a fresh target was used for each run or a single target was used for a sequence of runs.

Golub, Morton A.↗
NASA NTRS1998

Fluoropolymer Films Deposited by RF Plasma Sputtering of Polytetrafluoroethylene Using Inert Gases

The FT-IR (Fourier Transform Infrared), UV (Ultraviolet) and XPS (X Ray Photoelectron Spectroscopy) spectra of fluoropolymer films (SPTFE) deposited by rf (radio frequency) plasma sputtering of polytetrafluoroethylene (PTFE), using Ne, Kr and Xe as sputtering gases, were obtained and compared with prior spectra for SPTFE formed using He and Ar. The F/C (fluorine / carbon) ratios for SPTFE films (1.44-1.55), obtained at a rf power of 10 W, were essentially the same for all five rare gases, there being no trend of decreasing fluorine content in the SPTFE product with increasing atomic weight of the sputtering gas - contrary to the momentum transfer notion advanced by M. E. Ryan, et al. Increasing rf power from 10 to 50 W resulted in successively lower F/C ratios for SPTFE (e.g., from 1.55 to 1.21 in the case of Xe plasma-sputtered PTFE), accompanied by sputtering of the glass reactor and deposition of fragments of sodium aluminum silicate occurring at 40 W and above. In order to achieve a "Teflon-like" SPTFE structure (i.e., products with as high a F/C ratio as possible) in a given plasma reactor, an optimum rf power must be found, which in the present case was approximately 10 W.

Golub, Morton A.↗
NASA NTRS1997

XPS Study of Plasma- and Argon Ion-Sputtered Polytetrafluoroethylene

The similarity of plasma-polymerized tetrafluoroethylene (PPTFE) and the fluoropolymer film deposited by rf (radio frequency) plasma sputtering (SPTFE) of polytetrafluoroethylene (PTFE), noted earlier in the literature, has been reconfirmed. FT-IR (Fourier Transform Infrared), XPS (X ray Photoelectron Spectroscopy) and UV (ultraviolet) spectroscopy has been employed in apparently the first study to involve preparation of PPTFE and SPTFE in the same reactor and under comparable low-power plasma conditions. Most of the work concerned the use of He or Ar as sputtering gas, but some runs were also carried out with the other rare gases Ne, Kr and Xe. The C1s XPS spectra of SPTFE films displayed a relatively higher content of CF2 groups, and yielded higher F/C (fluorine / carbon) ratios, than PPTFE films, while the SPTFE films were somewhat more transparent in the UV than PPTFE. The F/C ratios for SPTFE were essentially independent of the rare gas used for sputtering. Increasing rf power from 10 to 50 W for Xe plasma-sputtering of PTFE resulted in successively lower F/C ratios (1.55 to 1.21), accompanied by sputtering of the glass reactor occurring at 40 W and above. Some limited XPS, FT-IR and UV data are presented on Ar ion-sputtered PTFE.

Golub, Morton A.↗
NASA NTRS1996

Relative Rates for Plasma Homo- and Copolymerizations of Olefins in a Homologous Series of Fluorinated Ethylenes

The relative rates of plasma (co)polymerizations of ethylene, vinyl fluoride, vinylidene fluoride, trifluoroethylene and tetrafluoroethylene (VF(sub x); x = 0-4, respectively) were determined in an rf, capacitively coupled, tubular reactor with external electrodes using identical plasma parameters. The averages of deposition rates obtained by both microgravimetry and ellipsometry were plotted versus the F/C ratios of the monomers or monomer blends. The deposition rates for VF(sub x)(x = 1-3) and 20 monomer blends were all located above a straight line joining the rates for VF(sub 0) and VF(sub 4), following a concave-downward plot of deposition rate versus F/C ratio similar to that reported previously for VF(sub 0)/VF(sub 4) blends. The deposition rates for VF(sub m)/VF(sub n) blends (m = 3 or 4; n = 0-2) were all greater than expected for non-interacting monomers; those for VF(sub 0)/VF(sub 2) and VF(sub 1)/VF(sub 2) blends were all lower than expected; while those for VF(sub 0)/VF(sub 1) and VF(sub 3)/VF(sub 4) blends fen on a straightline plot versus F/C ratio, indicative of apparent non-interaction between monomers. The mechanisms for plasma (co)polymerizations of VF(sub x) monomers responsible for the wide range of relative deposition rates remain to be elucidated.

Golub, Morton A.↗
NASA NTRS1995

Concerning Apparent Similarity of Structures of Fluoropolymer Surfaces Exposed to an Argon Plasma or Argon Ion Beam

X-ray photoelectron spectroscopy (XPS) C(sub 1s) spectra of fluoropolymers exposed to either an argon plasma or argon ion beam show remarkable similarity, implying that the surface-modification reactions for these two processes likely proceed through comparable mechanisms, revolving predominantly ion-surface interactions. The importance of working with a monochromatized x-ray source for XPS analysis of the surface-modified fluoropolymers is once again emphasized.

Golub, Morton A.↗
NASA NTRS1994

X-ray Photoelectron Spectroscopy Study of Argon-Plasma-Treated Fluoropolymers

Films of poly(tetrafluoroethylene) (PTFE) and of a tetrafluoroethylene-perfluoroalkyl vinyl ether (approximately 49:1) copolymer (PFA) were exposed to a radio-frequency argon plasma and then examined by X-ray photoelectron spectroscopy (XPS). The use of fluoropolymer films nearly free of surface hydrocarbon contamination as well as the use of a monochromatized X-ray source for XPS removed two factors contributing to conflicting reports on the effect of exposure time on the fluorine-to-carbon (F/C) and oxygen-to-carbon (O/C) ratios for several Ar-plasma-treated fluoropolymers. Contrary to literature indications, a common pattern was found for PTFE and PFA: a moderate decrease in F/C ratio (from 1.99 to 1.40, and from 1.97 to 1.57, respectively), together with a moderate increase in O/C ratio (from negligible to about 0.10, and from 0.012 to about O.10, respectively) at very short exposures, after which the F/C ratios remained essentially constant on prolonged exposures, while the O/C ratios for PTFE and PFA leveled off at 0.11 and 0.15, respectively. The XPS C(sub 1s), spectra for these polymers exposed to the Ar plasma for 20 min were similar and presented, besides a prominent peak at 292.0 eV (CF2,) and a minor peak at 294.0 or 294.1 eV (CF3), a composite band of four curve-resolved peaks (approximately 285-290 eV) representing various CH, CC, CO, CN, and CF functionalities.

Golub, Morton A.↗
NASA NTRS1993

X-Ray Photoelectron Spectroscopy Study of the Effect of Hydrocarbon Contamination on Poly(Tetrafluoroethylene) Exposed to a Nitrogen Plasma

It has been shown that unless the surface of poly(tetrafluoroethylene)(PTFE) is free of hydrocarbon contamination, anomalous changes in the oxygen and fluorine contents, as measured by X-ray photoelectron spectroscopy (XPS), and hence also the surface properties, may be improperly ascribed to a PTFE film exposed to a oxygen plasma.

Golub, Morton A.↗
NASA NTRS1992

Degradation Of Fluoropolymers by O(3P)

Three reports describe experimental studies of degradation of some fluoropolymers (and few nonfluorinated polymers) by monatomic oxygen in 3P state. Studies motivated by need to develop polymeric coats to protect some components of spacecraft against highly reactive O(3P) atmosphere at typical low Earth orbital altitudes. Results indicate fully fluorinated polymers most resistant to oxidation, while cross-linked (but otherwise fully fluorinated) fluoropolymers most resistant to etching.

Wydeven, Theodore↗
NASA NTRS1992

Waste streams in a crewed space habitat. II

An update is presented of a compilation of generation rates and chemical compositions of potential waste streams in a typical crewed space habitat which was reported in the NASA Technical Memorandum. New topics under consideration include data obtained from Soviet literature on life support issues and data on various minor human body wastes not presented previously (saliva, Flatus, hair, finger- and toenails, dried skin and skin secretions, tears and semen). Attention is also given to the latest information on the environmental control and life support system design parameters for SSF.

Golub, Morton A.↗
NASA NTRS1992

Reactions of atomic oxygen /O(3P)/ with polymer films

The reactions of polymer films with oxygen atoms are reviewed focusing on laboratory tests on polybutadienes with different amount of 1,4 or 1,2 double bonds and their polyalkenamer homologues, polyimide (Kapton), and a series of polyolefines with increasing fluorine content. It is found that etch rates increase with decrease in -CH=CH- unsaturation, starting with 1,4 -polybutadiene and reaching the maximum rate with polyethylene or ethylene-propylene rubber. IN polybutadienes with both 1,4 and 1,2 double bonds, the rate of O(3P)-induced etching is lower the higher the 1,2 content. The reactions are confined to the polymer surface.

Golub, Morton A.↗
NASA NTRS1992

Plasma copolymerization of ethylene and tetrafluoroethylene

An IR and XPS study of the low-pressure, radiofrequency, glow-discharge plasma copolymerization of ethylene (ET) and tetrafluoroethylene (TFE) is presented. The potential for creating Tefzel- or Teflon-like coatings on various polymeric substrates for use in advanced life support systems is examined.

Golub, Morton A.↗
NASA NTRS1991

XPS study of the effect of hydrocarbon contamination on polytetrafluoroethylene (teflon) exposed to atomic oxygen

The presence of hydrocarbon contamination on the surface of polytetrafluoroethylene (PTFE) markedly affects the oxygen uptake, and hence the wettability, of this polymer when exposed to an oxygen plasma. As revealed by X-ray photoelectron spectroscopy (XPS) analysis, the oxygen-to-carbon ratio (O/C) for such a polymer can increase sharply, and correspondingly the fluorine-to-carbon ratio (F/C) can decrease sharply, at very short exposure times; at longer times, however, such changes in the O/C and F/C ratios reverse direction, and these ratios then assume values similar to those of the unexposed PTFE. The greater the extent of hydrocarbon contamination in the PTFE, the larger are the amplitudes of the 'spikes' in the O/C- and F/C-exposure time plots. In contrast, a pristine PTFE experiences a very small, monotonic increase of surface oxidation or O/C ratio with time of exposure to oxygen atoms, while the F/C ratio is virtually unchanged from that of the unexposed polymer (2.0). Unless the presence of adventitious hydrocarbon is taken into account, anomalous surface properties relating to polymer adhesion may be improperly ascribed to PTFE exposed to an oxygen plasma.

Golub, Morton A.↗
NASA NTRS1991

Reactions Of Atomic Oxygen {O(3P)} With Polybutadienes

Report describes experimental study of chemical reactions of atomic oxygen in ground state {O(3P)} with polybutadienes and related polymers. Attention focused on such reactions because of adverse effects of environmental atomic oxygen on polymeric materials in low orbits around Earth.

Golub, Morton A.↗
NASA NTRS1991

A conformal oxidation-resistant, plasma-polymerized coating

A comparative study was made of the surface recession (etching) of thin films of plasma polymerized tetrafluoro ethylene (PPTFE), polytetrafluoro ethylene (PTFE), and ion-beam sputter deposited polytetrafluoro ethylene (SPTFE) exposed to ground-state atomic oxygen downstream from a nonequilibrium radio-frequency O2 plasma. At 22 C, the etch rates for PTFE, SPTFE, and PPTFE were in the ratio of 8.7:1.8:1.0. A thin, conformal coating of PPTFE (etch rate of 0.3 nm/h at 22 C) was found to protect an underlying cast film of a reactive polymer, cis-1,4 polybutadiene, against ground-state atomic oxygen attack for the time required to fully etch away the PPTFE coating. From ESCA analysis, PTFE exhibited only minor surface oxidation (uptake of 0.5 atom percent O) upon etching, its F/C ratio decreasing slightly from 2.00 to 1.97; PPTFE exhibited considerable surface oxidation (uptake of 5.9 atom percent O) intermediate between those of PTFE and PPTFE, with a decrease in F/C ratio from 1.73 to 1.67. A plasma-polymerized fluorocarbon coating such as PPTFE might be useful for space applications to protect polymers that are vulnerable to oxidation or degradation by oxygen atoms.

Golub, Morton A.↗
NASA NTRS1991

ESCA study of the effect of hydrocarbon contamination on poly(tetrafluoroethylene) exposed to atomic oxygen plasma

The ESCA spectra and data obtained by Morra et al. (1989) on poly(tetrafluoroethylene) (PTFE) exposed to atomic oxygen plasma are closely reexamined. It is shown that the spikes observed in Morra et al. plots of O/C or F/C versus time of the exposure of PTFE to atomic oxygen plasma were not characteristic of PTFE per se but were instead a result of a contamination by hydrocarbon present in their PTFE samples. This was demonstrated experimentally by comparing data derived for a very clean PTFE sample exposed for 10, 20, and 30 min to oxygen plasma with data obtained on PTFE samples with very small amounts of hydrocarbon contamination.

Golub, Morton A.↗
NASA NTRS1990

Generation rates and chemical compositions of waste streams in a typical crewed space habitat

A judicious compilation of generation rates and chemical compositions of potential waste feed streams in a typical crewed space habitat was made in connection with the waste-management aspect of NASA's Physical/Chemical Closed-Loop Life Support Program. Waste composition definitions are needed for the design of waste-processing technologies involved in closing major life support functions in future long-duration human space missions. Tables of data for the constituents and chemical formulas of the following waste streams are presented and discussed: human urine, feces, hygiene (laundry and shower) water, cleansing agents, trash, humidity condensate, dried sweat, and trace contaminants. Tables of data on dust generation and pH values of the different waste streams are also presented and discussed.

Wydeven, Theodore↗
NASA NTRS1989

ESCA study of several fluorocarbon polymers exposed to atomic oxygen in low earth orbit or within or downstream from a radio-frequency oxygen plasma

The ESCA (electron spectroscopy for chemical analysis) spectra of films of Tedlar, tetrafluoroethylene-hexafluoropropylene copolymer (in the form of a Teflon FEP coating on Kapton H, i.e., Kapton F), and polytetrafluoroethylene (Teflon or Teflon TFE), exposed to atomic oxygen O(3P) either in LEO on the STS-8 Space Shuttle or within or downstream from a radio-frequency oxygen plasma, were compared. The major difference in surface chemistry of Tedlar induced by the various exposures to O(3P) was a much larger uptake of oxygen when etched either in or out of the glow of an O2 plasma than when etched in LEO. In contrast, Kapton F exhibited very little surface oxidation during any of the three different exposures to O(3P), while Teflon was scarcely oxidized.

Golub, Morton A.↗