Engineering topics

Goodman, T.

Publications and source records attributed to Goodman, T..

4 records

DOE OSTI2021

Millimeter-wave beam scattering and induced broadening by plasma turbulence in the TCV tokamak

The scattering of millimeter-wave beams from electron density fluctuations and the associated beam broadening are experimentally demonstrated. Using a dedicated setup, instantaneous deflection and (de-)focusing of the beam due to density blobs on the beam path are shown to agree with full-wave simulations. The detected time-averaged wave power transmitted through the turbulent plasma is reproduced by the radiative-transfer model implemented in the WKBeam code, which predicts a ~50% turbulence-induced broadening of the beam cross-section. Finally, the role of core turbulence for the considered geometry is highlighted.

70 PLASMA PHYSICS AND FUSION TECHNOLOGY↗

NASA NTRS1995

The design and development of a third generation OSEE instrument

Optically Stimulated Electron Emission (OSEE) has been used to quantify surface contamination in the aerospace community. As advances are made towards the understanding of OSEE, it is desirable to incorporate technological advances with succeeding generations of instrumentation, so that improvements in the practical application of OSEE may be disseminated among the user community. Several studies undertaken by Yost, Welch, Abedin and others have expanded the knowledge base related to the underlying principles of OSEE. The conclusions of these studies, together with inputs from the user community were the foundation upon which the development of a third generation OSEE instrument was based. This manuscript describes the significant improvements incorporated into a third generation OSEE instrument as well as the elements unique to its design.

Perey, D. F.↗

NASA NTRS1993

Characterization facility for magneto-optic media and systems

Objectives of this research are: (1) to measure the hysteresis loop, Kerr rotation angle, anisotropy energy profile, Hall voltage, and magnetoresistance of thin-film magneto-optic media using our loop-tracer; (2) measure the wavelength-dependence of the Kerr rotation angle, Theta(sub k), and ellipticity, epsilon(sub k), for thin-film media using our magneto-optic Kerr spectrometer (MOKS); (3) measure the dielectric tensor of thin-film and multilayer samples using our variable-angle magneto-optic ellipsometer (VAMOE); (4) measure the hysteresis loop, coercivity, remanent magnetization, saturation magnetization, and anisotropy energy constant for thin film magnetic media using vibrating sample magnetometry; (5) observe small magnetic domains and investigate their interaction with defects using magnetic force microscopy; (6) perform static read/write/erase experiments on thin-film magneto-optic media using our static test station; (7) integrate the existing models of magnetization, magneto-optic effects, coercivity, and anisotropy in an interactive and user-friendly environment, and analyze the characterization data obtained in the various experiments, using this modeling package; (8) measure focusing- and tracking-error signals on a static testbed, determine the 'feedthrough' for various focusing schemes, investigate the effects of polarization and birefringence, and compare the results with diffraction-based calculations; and (9) measure the birefringence of optical disk substrates using two variable angle ellipsometers.

Mansuripur, M.↗

NASA NTRS1993

Measurement of birefringence for optical recording disk substrates

The birefringence of bare and coated substrates for magneto-optical recording is experimentally investigated using ellipsometry at the wavelengths of 632.8 nm and 780 nm. The rotation and ellipticity of the polarization state of the reflected or transmitted light is measured for different incident angles and different orientations of the incident linear polarization. The measured data is then fitted by a computer program which solves the Maxwell equations for the plane-wave propagation in a multilayer structure and minimizes the error between the measured and calculated data by adjusting the unknown parameters of the multilayer. This approach enables us to determine orientations of the three principal axes in the substrate and the corresponding refractive indices. A special feature of our ellipsometers is that a glass hemisphere is placed in contact with the substrate, which eliminates the refraction of the incident light and enables a maximum propagation angle of 70 degrees (with respect to the normal) in the substrate. This increases the sensitivity of the measurement. Certain anomalies were observed, which we believe are associated with the presence of grooves on these substrates.

Fu, Hong↗