Engineering topics

Graham, Michael E.

Publications and source records attributed to Graham, Michael E..

4 records

NASA NTRS2014

Toward Large-Area Sub-Arcsecond X-Ray Telescopes

The future of x-ray astronomy depends upon development of x-ray telescopes with larger aperture areas (>1 sq m) and finer angular resolution(<1).Combined with the special requirements of nested grazing incidence optics, the mass and envelope constraints of spaceborne telescopes render such advances technologically challenging. Achieving this goal will require precision fabrication, alignment, mounting, and assembly of large areas (>100 sq m) of lightweight (1 kg/sq m areal density) high quality mirrors-possibly entailing active (in-space adjustable) alignment and figure correction. This paper discusses relevant programmatic and technological issues and summarizes progress toward large area sub-arcsecond x-ray telescopes. Key words: X-ray telescopes, x-ray optics, active optics, electroactive devices, silicon mirrors, differential deposition, ion implantation.

O'Dell, Stephen L.↗

NASA NTRS2014

Toward Large-Area Sub-Arcsecond X-Ray Telescopes

The future of x-ray astronomy depends upon development of x-ray telescopes with larger aperture areas (approx. = 3 square meters) and fine angular resolution (approx. = 1 inch). Combined with the special requirements of nested grazing-incidence optics, the mass and envelope constraints of space-borne telescopes render such advances technologically and programmatically challenging. Achieving this goal will require precision fabrication, alignment, mounting, and assembly of large areas (approx. = 600 square meters) of lightweight (approx. = 1 kilogram/square meter areal density) high-quality mirrors at an acceptable cost (approx. = 1 million dollars/square meter of mirror surface area). This paper reviews relevant technological and programmatic issues, as well as possible approaches for addressing these issues-including active (in-space adjustable) alignment and figure correction.

ODell, Stephen L.↗

NASA NTRS1991

High rate reactive sputtering of MoN(x) coatings

High rate reactive sputtering of MoN(x) films was performed using feedback control of the nitorgen partial pressure. Coatings were made at four different target powers: 2.5, 5.0, 7.5 and 10 kW. No hysteresis was observed in the nitrogen partial pressure vs. flow plot, as is typically seen for the Ti-N system. Four phases were determined by X-ray diffraction: molybdenum, Mo-N solid solution, Beta-Mo2N and gamma-Mo2N. The hardness of the coatings depended upon composition, substrate bias, and target power. The phases present in the hardest films differed depending upon deposition parameters. For example, the Beta-Mo2N phase was hardest (load 25 gf) at 5.0 kW with a value of 3200 kgf/sq mm, whereas the hardest coatings at 10 kW were the gamma-Mo2N phase (3000 kgf/sq mm). The deposition rate generally decreased with increasing nitrogen partial pressure, but there was a range of partial pressures where the rate was relatively constant. At a target power of 5.0 kW, for example, the deposition rates were 3300 A/min for a N2 partial pressure of 0.05 - 1.0 mTorr.

Rudnik, Paul J.↗

NASA NTRS1990

High rate reactive sputtering in an opposed cathode closed-field unbalanced magnetron sputtering system

Attention is given to an opposed cathode sputtering system constructed with the ability to coat parts with a size up to 15 cm in diameter and 30 cm in length. Initial trials with this system revealed very low substrate bias currents. When the AlNiCo magnets in the two opposed cathodes were arranged in a mirrored configuration, the plasma density at the substrate was low, and the substrate bias current density was less than 1 mA/sq cm. If the magnets were arranged in a closed-field configuration where the field lines from one set of magnets were coupled with the other set, the substrate bias current density was as high as 5.7 mA/sq cm when NdFeB magnets were used. In the closed-field configuration, the substrate bias current density was related to the magnetic field strength between the two cathodes and to the sputtering pressure. Hard well-adhered TiN coatings were reactively sputtered in the opposed cathode system in the closed-field configuration, but the mirrored configuration produced films with poor adhesion because of etching problems and low plasma density at the substrate.

Sproul, William D.↗