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Kafle, Nischal

Publications and source records attributed to Kafle, Nischal.

Ion cyclotron heating at high plasma density in Proto-MPEX

The physics of ion cyclotron heating (ICH) relevant to the steady-state linear machine MPEX (Material Plasma Exposure eXperiment) has been explored in its predecessor, short-pulse device: Proto-MPEX. MPEX will utilize fundamental ICH to increase heat flux at the target and produce ion temperatures and velocity distributions with improved fidelity to those found in a tokamak divertor region, in comparison to those produced by substrate biasing. In the experiments on Proto-MPEX described here, bulk ion temperatures up to ~15 eV have been achieved with 20 kW net ICH power at 6.5 MHz, using ICH heating of a deuterium plasma produced by a helicon plasma source. The heat flux at the target has been observed to increase throughout the plasma cross section, including in the core region. Core $T_i$ and target heat flux are observed to scale linearly with injected ICH power. Further, measurements of plasma loading and target heat flux as a function of the magnetic field strength at the antenna, together with modeling of the wave propagation from the antenna to the ion cyclotron resonance using the ANTENA and COMSOL codes with a warm plasma dielectric tensor, indicate that power is coupled to the core plasma via fast wave excitation of a kinetic Alfvén wave.

70 PLASMA PHYSICS AND FUSION TECHNOLOGY↗

Implementation of a portable diagnostic system for Thomson scattering measurements on an electrothermal arc source

To fulfill the increasing needs of diagnostic support for researchers in plasma technology, a portable diagnostic package (PDP) equipped for both laser Thomson scattering (TS) and optical emission spectroscopy has been designed and constructed at Oak Ridge National Laboratory (ORNL), aiming to measure the temperature and number density of electrons and temperatures of ions in plasma devices. The PDP has been initially implemented on a high density and low temperature electrothermal arc source (ET-arc) at ORNL to test its TS capability. TS from the plasmas in the ET-arc has been obtained using the PDP. The electron temperature and number density were determined from TS spectra. These results were then compared to measurements from previous studies on the ET-arc. The TS diagnostic measured 0.8 ± 0.1, 1.3 ± 0.2, and 0.7 ± 0.1 eV and (4.4 ± 0.5) × 1021, (5.9 ± 0.7) × 1021, and (4.3 ± 0.5) x 1021 m-3, respectively, from three lines of sight that transect the plasma column.

He, Z. (ORCID:0000000183159882)↗

Portable diagnostic package for Thomson scattering and optical emission spectroscopy on Princeton field-reversed configuration 2 (PFRC 2)

An Advanced Research Projects Agency-Energy funded diagnostic system has been deployed to the Princeton field-reversed configuration 2 (PFRC-2) device, located at Princeton Plasma Physics Laboratory. The Portable Diagnostic Package (PDP), designed at Oak Ridge National Laboratory, allows for the measurement of Thomson Scattering (TS) for electron density and temperature and Optical Emission Spectroscopy (OES) for ion temperature, impurity density, and ion velocity. A tunable spectrometer on the PDP with three gratings provides the flexibility to measure low (1 eV) and high (1000 eV) electron temperature ranges from TS. Additionally, using a second spectrometer, the OES diagnostic can survey light emission from various ion excitation levels for wide wavelength ranges. The electron density (<2 × 10 19 m –3 ) of plasmas generated in PFRC-2 has been below the PDP TS discrimination threshold, which has made TS signal detection challenging against a high-background of laser stray light. The laser stray light was iteratively reduced by making modifications to the entrance and exit geometry on PFRC-2. Rayleigh scattering experiments on PFRC have yielded the TS discrimination sensitivity to be >1 × 10 20 m –3 for the PDP. A recently implemented narrow-band notch spectral filter that masks the second harmonic 532 nm Nd:YAG laser wavelength has increased the system’s TS light discrimination sensitivity 65 times compared to the instance when the notch filter was not implemented. The hardware implementation including design changes to the flight tubes and Brewster windows will be discussed, along with results from Rayleigh and rotational Raman scattering sensitivity analyses, which were used to establish a quantitative figure of merit on the system performance. Further, the Raman scattering calibration with the notch filter has improved the PDP electron density threshold to 1 ± 0.5 × 10 18 m –3 .

47 OTHER INSTRUMENTATION↗

Reconfiguration of an Electrothermal-Arc Plasma Source for In Situ PMI Studies

An electrothermal-arc plasma source (ET-Arc) has been developed to produce transient plasma heat and particle fluxes similar to those produced by edge localized modes onto divertor plasma-facing components in tokamaks. The ET-Arc utilizes a capacitive discharge to send current through a 4-mm-diameter, 9-cm-long capillary source liner. The liner material is ablated to form a high-velocity plasma jet that impacts the target downstream. With the current discharge circuit configuration, pulse lengths are 1 to 2 ms in duration and deliver heat fluxes of 0.25 to 2.1 GW m-2. The plasma was previously characterized with optical emission spectroscopy (OES) on helium emission lines. The He I line ratios were interpreted with collisional radiative analysis to calculate ne and Te. The electron temperature and electron density ranged from Te = 1 to 5 eV and ne = 1022 to 1028 electrons/m3, respectively.

Lindquist, Elizabeth G.↗

Design and implementation of a portable diagnostic system for Thomson scattering and optical emission spectroscopy measurements

A diagnostic system, which has a design goal of high-portability, has been designed at Oak Ridge National Laboratory (ORNL). This project aims at providing measurements of key plasma parameters (ne, Te, ni, Ti) for fusion-relevant devices, utilizing Thomson scattering (TS) and optical emission spectroscopy (OES). The innovative design employs mostly commercial off-the-shelf instrumentation and a traveling team of researchers to conduct measurements at various magnetic-confinement plasma devices. The TS diagnostic uses a Quantel Q-smart 1500 Nd:YAG laser with a 2ω harmonic generator to produce up to 850 mJ of 532 nm laser pulses at 10 Hz. Collection optics placed at the detection port consists of an 11 × 3 optical fiber bundle, where the TS diagnostic uses an 11 × 1 subset array of the fibers, the OES diagnostic uses another 11 fibers, and the remaining fibers are available to the host institution. The detection system is comprised of two separate IsoPlane-320 spectrometers with triple-grating turrets of various line spacing and two PI-MAX 4 intensified CCD detectors, used simultaneously to measure a broad range of ion, impurity, and electron parameters. The self-contained diagnostic package also includes a data processing and storage system. The design and initial implementation of the TS-OES diagnostic system are described. The experiments from the proof-of-principle operation of the portable package on a high density (∼2.5 × 1022 m−3) and low-temperature (∼5 eV) electrothermal arc source at ORNL are also discussed.

Kafle, N. (ORCID:000000028144787X)↗

Experimental Investigation of the Effects of Magnetic Mirrors on Plasma Transport in the Prototype Material Plasma Exposure Experiment

The Prototype Material Plasma Exposure eXperiment (Proto-MPEX) at Oak Ridge National Laboratory is developing a helicon radio frequency (RF) source for plasma production along with microwave electron heating and RF ion heating. Proto-MPEX has several magnetic mirrors that affect plasma transport. The magnetic field near the helicon source is ~ 0.05 T, and the peak magnetic field in Proto-MPEX is ~ 1.8 T, which results in a large magnetic well for particles sourced at the helicon transporting toward the target region. Keeping the helicon source field and the target field constant, experiments have been conducted by methodically changing the magnetic field, at a local axial location, within the source and the target. Plasma flow measurements using Mach probes have shown a decrease in the flow as a function of the magnetic mirror ratio. Plasma flows were further investigated with ion cyclotron resonant heating (ICH). Results with the addition of ICH measured upstream of the antenna have shown a decrease in Mach number as a function of mirror ratio when compared to helicon discharges. Such flow behavior demonstrated slowing down of the plasma due to the increased reverse plasma flow toward the helicon plasma source. However, in high magnetic fields, when the resonant magnetic field moved away from the ICH antenna, no effects on the plasma flow due to ICH were observed.

Kafle, Nischal↗

Effect of magnetic field ripple on parallel electron transport during microwave plasma heating in the Proto-MPEX linear plasma device

The Prototype Material Plasma Exposure eXperiment (Proto-MPEX) is a linear plasma device located at Oak Ridge National Laboratory to develop the plasma source concept for the Materials Plasma Exposure eXperiment (MPEX). Recent experiments have demonstrated the heating of electrons in a high-density deuterium plasma (n e ~ 5 × 10 19 m -3 ) via electron Bernstein waves and source plasma production via helicon waves in this linear configuration. Moreover, experimental observations suggest that the magnetic ripple adversely affects the parallel transport of the heated electrons toward the target where material samples are to be exposed to the plasma. In order to understand the transport process during microwave application, a test-particle Monte-Carlo (MC) code has been developed that incorporates the effects of Coulomb collisions, magnetic mirror adiabatic trapping and electron cyclotron interaction via a quasilinear RF heating operator. MC calculations indicate that the absence of 2nd turning points along the trajectory of cyclotron heated electrons significantly reduces adiabatic trapping and maximizes power transport to the Target surface. Thermalization of cyclotron heating electrons is analyzed with the MC code and it is found that for conditions relevant to ProtoMPEX, a significant fraction of the absorbed heating power is coupled to the Target surface via ballistic fast electrons; however, under certain conditions, up to 60% of the absorbed RF power can be dissipated via thermalization of the fast electrons on the background plasma. Results are compared with experimental measurements. Finally, the implications of the results are discussed in the context of the upcoming MPEX device.

70 PLASMA PHYSICS AND FUSION TECHNOLOGY↗

The Materials Plasma Exposure eXperiment: Status of the Physics Basis Together With the Conceptual Design and Plans Forward

The Materials Plasma Exposure eXperiment (MPEX) is a linear plasma device that will address the plasma–material interaction (PMI) science for future fusion reactors and will enable testing of plasma-facing components (PFCs). It is designed as a steady-state device eventually delivering an ion fluence of up to 10 31 m -2 to the target. The device will be designed to handle neutron-activated materials. These capabilities should push the technical readiness level of PFCs up to six for some end-of-life aspects. In order to achieve the relevant plasma conditions, as they are expected in future fusion reactor divertors, MPEX will utilize a novel plasma source concept. This plasma source concept uses a high-power helicon (200 kW, 13.56 MHz), an electron cyclotron heating (ECH) system, which will heat electrons via electron Bernstein wave (EBW) heating (about 400 kW, 70 GHz), and an ion cyclotron heating (ICH) system (400 kW, 6–9 MHz). The physics basis for this plasma source concept including the heating physics and transport is based on experiments on Proto-MPEX. An overview of the experimental results and the physics basis will be given. The physics basis directly translates into functional requirements of MPEX and the conceptual design. The status of the conceptual design of MPEX will be shown.

70 PLASMA PHYSICS AND FUSION TECHNOLOGY↗