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Kearney, Steven P.

Publications and source records attributed to Kearney, Steven P..

Mechanical Design Progress of the In Situ Nanoprobe Instrument for APS-U

The In Situ Nanoprobe (ISN, 19-ID) beamline will be a new best-in-class long beamline to be constructed as part of the Advanced Photon Source Upgrade (APS-U) project [1, 2]. To achieve long working distance at high spatial resolution, the ISN instrument will be positioned 210 m downstream of the x-ray source, in a dedicated satellite building, currently under construction [3]. The ISN instrument will use a nano-focusing Kirkpatrick-Baez (K-B) mirror system, which will focus hard x-rays to a focal spot as small as 20 nm, with a large working distance of 61 mm. The large working distance provides space for various in situ sample cells for x-ray fluorescence tomography and ptychographic 3D imaging, allows the use of a separate, independent vacuum chambers for the optics and sample, and provides the flexibility to run experiments in vacuum or at ambient pressure. A consequence of the small spot size and large working distance are stringent requirements for high angular stability of the K-B mirrors (5 nrad V-mirror and 16 nrad H-mirror) and high relative stability be-tween focus spot and sample (4 nmRMS). Additional features include fly-scanning up to 2 kg mass, sample plus in situ cell, at 1 mm/s in vertical and/or horizontal directions over an area of 10 mm x 10 mm. Environmental capabili-ties will include heating and cooling, flow of fluids and applied fields, as required for electrochemistry and flow of gases at high temperature for catalysis. To achieve these capabilities and precise requirements we have used precision engineering fundamentals to guide the design process.

Kearney, Steven P.↗

Method and precision nanopositioning apparatus with compact vertical and horizontal linear nanopositioning flexure stages for implementing enhanced nanopositioning performance

An enhanced method and precision nanopositioning apparatus for implementing enhanced nanopositioning performance is provided. The nanopositioning apparatus includes a vertical linear nanopositioning flexure stage and a horizontal linear nanopositioning flexure stage. The vertical linear nanopositioning flexure stage includes a stage base, a symmetrically configured flexure linear guiding mechanism with precision motion enhancement structure, and a stage carriage. The horizontal linear nanopositioning flexure stage is mounted on the stage carriage of the vertical linear nanopositioning flexure stage, and includes a middle-bar relative position control mechanism to enhance the stiffness of a flexure linear guiding mechanism.

77 NANOSCIENCE AND NANOTECHNOLOGY↗