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Kim, Jongmin

Publications and source records attributed to Kim, Jongmin.

At least 19 records

SIF-based GPP modeling for evergreen forests considering the seasonal variation in maximum photochemical efficiency

Solar-induced chlorophyll fluorescence (SIF) has shown great potential in estimating gross primary production (GPP). However, their quantitative relationship is not invariant, which undermines the reliability of empirical SIF-based GPP estimation at fine spatiotemporal scales, especially under extreme conditions. In this study, we developed a parsimonious mechanistic model for SIF-based GPP estimation in evergreen needle forests (ENF) by employing the Mechanistic Light Response framework and Eco-Evolutionary theory to describe the light and dark reactions during photosynthesis, respectively. Specifically, we found that considering the seasonal variation in a key parameter of the MLR framework, the maximum photochemical efficiency of photosystem II (Φ PSIImax ), can avoid the GPP overestimation in winter and early spring due to the relatively low environmental sensitivity of SIF. Compared to the estimates from other benchmark models, our GPP estimates were closer to the 1: 1 line and had higher accuracy (average R 2 = 0.86, RMSE=1.99 μmol m -2 s -1 ) across sites. Furthermore, the changes in the relationship between SIF and J (refers to the electron transport rate) contribute a lot to the dynamic SIF–GPP relationship in this study, while the J–GPP relationship is less variant when the temperature drops. Further, the seasonal variation in the SIF–J relationship, especially the reduction in its slope at low temperatures, is found largely explained by the Φ PSIImax . These results indicate the importance of the uncertainty caused by the variation in the SIF–J relationship for SIF-based GPP estimation, and the consideration of changes in Φ PSIImax under extreme conditions (such as severe winter in this study) is crucial for the improvement of GPP estimation via SIF.

59 BASIC BIOLOGICAL SCIENCES↗

Leaf angle as a leaf and canopy trait: Rejuvenating its role in ecology with new technology

Abstract Life on Earth depends on the conversion of solar energy to chemical energy by plants through photosynthesis. A fundamental challenge in optimizing photosynthesis is to adjust leaf angles to efficiently use the intercepted sunlight under the constraints of heat stress, water loss and competition. Despite the importance of leaf angle, until recently, we have lacked data and frameworks to describe and predict leaf angle dynamics and their impacts on leaves to the globe. We review the role of leaf angle in studies of ecophysiology, ecosystem ecology and earth system science, and highlight the essential yet understudied role of leaf angle as an ecological strategy to regulate plant carbon–water–energy nexus and to bridge leaf, canopy and earth system processes. Using two models, we show that leaf angle variations have significant impacts on not only canopy‐scale photosynthesis, energy balance and water use efficiency but also light competition within the forest canopy. New techniques to measure leaf angles are emerging, opening opportunities to understand the rarely‐measured intraspecific, interspecific, seasonal and interannual variations of leaf angles and their implications to plant biology and earth system science. We conclude by proposing three directions for future research.

Yang, Xi↗

Depth Profiling Analysis of Aluminum Oxidation During Film Deposition in a Conventional High Vacuum System

The oxidation of aluminum thin films deposited in a conventional high vacuum chamber has been investigated using x-ray photoelectron spectroscopy (XPS) and depth profiling. The state of the Al layer was preserved by coating it with a protective MgF2 layer in the deposition chamber. Oxygen concentrations in the film layers were determined as a function of sputter time (depth into the film). The results show that an oxidized layer is formed at the start of Al deposition and that a less extensively oxidized Al layer is deposited if the deposition rate is fast. The top surface of the Al layer oxidizes very quickly. This top oxidized layer may be thicker than has been previously reported by optical methods. Maximum oxygen concentrations measured by XPS at each Al interface are related to pressure to rate ratios determined during the Al layer deposition.

Kim, Jongmin↗

Reflective Filters Design for Self-Filtering Narrowband Ultraviolet Imaging Experiment Wide-Field Surveys (NUVIEWS) Project

We report the design of multilayer reflective filters for the self-filtering cameras of the NUVIEWS project. Wide angle self-filtering cameras were designed to image the C IV (154.9 nm) line emission, and H2 Lyman band fluorescence (centered at 161 nm) over a 20 deg x 30 deg field of view. A key element of the filter design includes the development of pi-multilayers optimized to provide maximum reflectance at 154.9 nm and 161 nm for the respective cameras without significant spectral sensitivity to the large cone angle of the incident radiation. We applied self-filtering concepts to design NUVIEWS telescope filters that are composed of three reflective mirrors and one folding mirror. The filters with narrowband widths of 6 and 8 rim at 154.9 and 161 nm, respectively, have net throughputs of more than 50 % with average blocking of out-of-band wavelengths better than 3 x 10(exp -4)%.

Park, Jung- Ho↗

Multilayer Thin Film Polarizer Design for Far Ultraviolet using Induced Transmission and Absorption Technique

Good theoretical designs of far ultraviolet polarizers have been reported using a MgF2/Al/MgF2 three layer structure on a thick Al layer as a substrate. The thicknesses were determined to induce transmission and absorption of p-polarized light. In these designs Al optical constants were used from films produced in ultrahigh vacuum (UHV: 10(exp -10) torr). Reflectance values for polarizers fabricated in a conventional high vacuum (p approx. 10(exp -6 torr)) using the UHV design parameters differed dramatically from the design predictions. Al is a highly reactive material and is oxidized even in a high vacuum chamber. In order to solve the problem other metals have been studied. It is found that a larger reflectance difference is closely related to higher amplitude and larger phase difference of Fresnel reflection coefficients between two polarizations at the boundary of MgF2/metal. It is also found that for one material a larger angle of incidence from the surface normal brings larger amplitude and phase difference. Be and Mo are found good materials to replace Al. Polarizers designed for 121.6 nm with Be at 60 deg and with Mo at 70 deg are shown as examples.

Kim, Jongmin↗

Multilayer thin film design as far ultraviolet quarterwave retarders

At short wavelengths, such as FUV, transparent, optically active materials are scarce. Reflection phase retardation by a multilayer thin film can be a good alternative in this wavelength region. We design a multilayer quarterwave retarder by calculating the electric fields at each boundary in the multilayer thin film. Using this method, we achieve designs of FUV multilayers which provide high, matched reflectances for both s- and p-polarization states, and at the same time a phase difference between these two states of nearly 90 deg. For example, a quarterwave retarder designed at the Lyman-alpha line (121.6 nm) has 81.05 percent reflectance for the s-polarization and 81.04 percent for the p-polarization state. The phase difference between these two polarization states is 90.07 deg. For convenience the retarders are designed for 45 deg angle of incidence, but our design approach can be used for any other angle of incidence. Aluminum and MgF2 are used as film materials and an opaque thick film of aluminum as the substrate.

Kim, Jongmin↗

Multilayer thin film design as far ultraviolet polarizers

We use a concept of induced transmission and absorption to design multilayer thin film reflection polarizers in the FUV region. We achieve high s-polarization reflectance and a high degree of polarization by means of a MgF2/Al/MgF2 three layer structure on an opaque thick film of aluminum as the substrate. For convenience they are designed at a 45 deg angle of incidence. For example, our polarizer designed for the Lyman-alpha line (121.6 nm) has 88.67 percent reflectance for the s-polarization case, and 1.21 percent for the p-polarization case, with a degree of polarization of 97.31 percent. If we make a double surface polarizer with this design, it will have a degree of polarization of 99.96 percent and s-polarization throughput of 78.62 percent.

Kim, Jongmin↗

Polarimetry of the HI Lyman-alpha for coronal magnetic field diagnostics

We discuss and analyze the possible sources of observational and instrumental uncertainty that can be encountered in measuring magnetic fields of the solar corona through polarimetric observations of the Hanle effect of the coronal Ly-alpha line. The Hanle effect is the modification of the linear polarization of a resonantly scattered line, due to the presence of a magnetic field. Simulated observations are used to examine how polarimetric measurements of this effect are affected by the line-of-sight integration, the electron collisions, and the Ly-alpha geocorona. We plan to implement the coronal magnetic field diagnostics via the Ly-alpha Hanle effect using an all-reflecting Ly-alpha coronagraph/polarimeter (Ly-alphaCoPo) which employs reflecting multilayer mirrors, polarizers, and filters. We discuss here the requirements for such an instrument, and analyze the sources of instrumental uncertainty for polarimetric observations of the coronal Ly-alpha Hanle effect. We conclude that the anticipated polarization signal from the corona and the expected performance of the Ly-alphaCoPo instrument are such that the Ly-alpha Hanle effect method for coronal field diagnostics is feasible.

Fineschi, Silvano↗

Design and fabrication of the All-Reflecting H-Lyman-alpha Coronagraph/Polarimeter

We have designed, analyzed, and are now fabricating an All-Reflecting H-Lyman-alpha Coronagraph/Polarimeter for solar research. This new instrument operates in a narrow bandpass centered at 215.7 A - the neutral hydrogen Ly-alpha line. It is shorter and faster than the telescope which produced solar Ly-alpha images as a part of the MSSTA payload that was launched on May 13, 1991. The Ly-alpha line is produced and linearly polarized in the solar corona by resonance scattering, and the presence of a magnetic field modifies this polarization according to the Hanle effect. The Lyman-alpha Coronagraph/Polarimeter instrument has been designed to measure coronal magnetic fields by interpreting, via the Hanle effect, the measured linear polarization of the coronal Ly-alpha line. Ultrasmooth mirrors, polarizers, and filters are being flow-polished for this instrument from CVD silicon carbide substrates. These optical components will be coated using advanced induced transmission and absorption thin film multilayer coatings to optimize the reflectivity and polarization properties at 1215.7 A. We describe some of the solar imaging results obtained with the MSSTA Lyman-alpha coronagraph. We also discuss the optical design parameters and fabrication plans for the All-Reflecting H-Lyman-alpha Coronagraph/Polarimeter.

Hoover, Richard B.↗

Filters for the International Solar Terrestrial Physics (ISTP) mission far ultraviolet imager

The far ultraviolet (FUV) imager for the International Solar Terrestrial Physics (ISTP) mission is designed to image four features of the aurora: O I lines at 130.4 nm and 135.6 nm and the N2 Lyman-Birge-Hopfield (LBH) bands between 140 nm - 160 nm (LBH long) and 160 nm - 180 nm (LBH long). In this paper we report the design and fabrication of narrow-band and broadband filters for the ISTP FUV imager. Narrow-band filters designed and fabricated for the O I lines have a bandwidth of less than 5 nm and a peak transmittance of 23.9 percent and 38.3 percent at 130.4 nm and 135.6 nm, respectively. Broadband filters designed and fabricated for LBH bands have the transmittance close to 60 percent. Blocking of out-of-band wavelengths for all filters is better than 5x10(exp -3) percent with the transmittance at 121.6 nm of less than 10(exp -6) percent.

Zukic, Muamer↗

Multilayer thin film design for far ultraviolet polarizers using an induced transmission and absorption technique

An explanation of induced transmission for spectral regions excluding the far ultraviolet (FUV) is given to better understand how induced transmission and absorption can be used to design effective polarizers in the FUV spectral region. We achieve high s-polarization reflectance and a high degree of polarization (P equals (Rs-Rp)/(Rs+Rp)) by means of a MgF2/Al/MgF2 three layer structure on an opaque thick film of Al as the substrate. For example, our polarizer designed for the Lyman-alpha line (lambda equals 121.6 nm) has 87.95 percent reflectance for the s-polarization case and 0.43 percent for the p-polarization case, with a degree of polarization of 99.03 percent. If a double reflection polarizer is made with this design, it will have a degree of polarization of 99.99 percent and s-polarization throughput of 77.35 percent.

Kim, Jongmin↗

Design and fabrication of a reflection far ultraviolet polarizer and retarder

New methods have been developed for the design of a far ultraviolet multilayer reflection polarizer and retarder. A MgF2/Al/MgF2 three-layer structure deposited on a thick opaque Al film (substrate) is used for the design of polarizers and retarders. The induced transmission and absorption method is used for the design of a polarizer and layer-by-layer electric field calculation method is used for the design of a quarterwave retarder. In order to fabricate these designs in a conventional high vacuum chamber, we have to minimize the oxidation of the Al layers and somehow characterize the oxidized layer. X-ray photoelectron spectroscopy is used to investigate the amount and profile of oxidation. Depth profiling results and a seven layer oxidation model are presented.

Kim, Jongmin↗

Transparent conductive coatings in the far ultraviolet

In certain cases a space-borne optical instrument with a dielectric window requires a transparent conductive coating deposited on the window to remove the electrostatic charge collected due to the bombardment of ionized particles. Semiconductor and metal films are studied for use as transparent conductive coatings for the front window of far ultraviolet camera. Cr is found to be the best coating material. The theoretical search for the semiconductor and metal coating materials and experimental results for ITO and Cr films are reported.

Kim, Jongmin↗

X ray, extreme and far ultraviolet optical thin films for space applications

Far and extreme ultraviolet optical thin film filters find many uses in space astronomy, space astrophysics, and space aeronomy. Spacebased spectrographs are used for studying emission and absorption features of the earth, planets, sun, stars, and the interstellar medium. Most of these spectrographs use transmission or reflection filters. This requirement has prompted a search for selective filtering coatings with high throughput in the FUV and EUV spectral region. Important progress toward the development of thin film filters with improved efficiency and stability has been made in recent years. The goal for this field is the minimization of absorption to get high throughput and enhancement of wavelength selection. The Optical Aeronomy Laboratory (OAL) at the University of Alabama in Huntsville has recently developed the technology to determine optical constants of bulk and film materials for wavelengths extending from x-rays (0.1 nm) to the FUV (200 nm), and several materials have been identified that were used for designs of various optical devices which previously have been restricted to space application in the visible and near infrared. A new design concept called the Pi-multilayer was introduced and applied to the design of optical coatings for wavelengths extending from x-rays to the FUV. Section 3 of this report explains the Pi-multilayer approach and demonstrates its application for the design and fabrication of the FUV coatings. Two layer Pi-stacks have been utilized for the design of reflection filters in the EUV wavelength range from 70 - 100 nm. In order to eliminate losses due to the low reflection of the imaging optics and increase throughput and out-of-band rejection of the EUV instrumentation we introduced a self-filtering camera concept. In the FUV region, MgF2 and LiF crystals are known to be birefringent. Transmission polarizers and quarterwave retarders made of MgF2 or LiF crystals are commercially available but the performances are poor. New techniques for the design of the EUV and FUV polarizers and quarterwave retarders are described in Section 5. X- and gamma-ray detectors rely on a measurement of the electron which is effected when a ray interacts with matter. The design of an x- and gamma-ray telescope to operate in a particular region of the spectrum is, therefore, largely dictated by the mechanism through which the rays interact. Energy selection and the focusing of the incident high energy rays can be achieved with spectrally selective high reflective multilayers. The design and spectral performance of narrowband reflective x-ray Pi-multilayers are presented in section 6.

Zukic, Muamer↗

Radiation Damage Effects in Far Ultraviolet Filters and Substrates

New advances in VUV thin film filter technology have been made using filter designs with multilayers of materials such as Al2O3, BaF2, CaF2, HfO2, LaF3, MgF2, and SiO2. Our immediate application for these filters will be in an imaging system to be flown on a satellite where a 2 X 9 R(sub E) orbit will expose the instrument to approximately 275 krads of radiation. In view of the fact that no previous studies have been made on potential radiation damage of these materials in the thin film format, we report on such an assessment here. Transmittances and reflectances of BaF2, CaF2, HfO2, LaF3, MgF2, and SiO2 thin films on MgF2 substrates, Al2O3 thin films on fused silica substrates, uncoated fused silica and MgF2, and four multilayer filters made from these materials were measured from 120 nm to 180 nm before and after irradiation by 250 krads from a Co-60 gamma radiation source. No radiation-induced losses in transmittance or reflectance occurred in this wavelength range. Additional postradiation measurements from 160 nm to 300 nm indicated a 3 - 5% radiation-induced absorption near 260 nm in some of the samples with MgF2 substrates. From these measurements it is concluded that far ultraviolet filters made from the materials tested should experience less that 5% change from exposure to up to 250 krads of high energy radiation in space applications.

Keffer, Charles E.↗

Design and Fabrication of the All-Reflecting H-Lyman alpha Coronagraph/Polarimeter

We have designed, analyzed, and are now fabricating an All-Reflecting H-Lyman alpha Coronagraph/Polarimeter for solar research. This new instrument operates in a narrow bandpass centered at lambda 1215.7 A-the neutral hydrogen Lyman alpha (Ly-alpha) line. It is shorter and faster than the telescope which produced solar Ly-alpha images as a part of the MSSTA payload that was launched on May 13, 1991. The Ly-alpha line is produced and linearly polarized in the solar corona by resonance scattering, and the presence of a magnetic field modifies this polarization according to the Hanle effect. The Lyman alpha Coronagraph/Polarimeter instrument has been designed to measure coronal magnetic fields by interpreting, via the Hanle effect, the measured linear polarization of the coronal Ly-alpha line. Ultrasmooth mirrors, polarizers, and filters are being flow-polished for this instrument from CVD silicon carbide substrates. These optical components will be coated using advanced induced transmission and absorption thin film multilayer coatings, to optimize the reflectivity and polarization properties at 1215.7 A. We describe some of the solar imaging results obtained with the MSSTA Lyman alpha coronagraph. We also discuss the optical design parameters and fabrication plans for the All-Reflecting H-Lyman alpha Coronagraph/Polarimeter.

Hoover, Richard B.↗