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Ma, Jonathan

Publications and source records attributed to Ma, Jonathan.

Chemical and structural characterization of EUV photoresists as a function of depth by standing-wave x-ray photoelectron spectroscopy

The success in the miniaturization of the electronic device constituents depends mostly on the photolithographic techniques. Recently, to achieve patterning at the sub-10-nm node, extreme ultraviolet (EUV) lithography has been introduced into high volume production. Continued scaling of EUV via increased numerical aperture to achieve nodes at 3-nm and below requires the development of fundamentally new patterning materials and new characterization methods. Current EUV-resist film thicknesses are in the 20- to 40-nm range, and further thickness reduction is required for the next generation. Therefore, interfaces become exceedingly important, and the properties of the resist film would be dominated by top and bottom interfacial effects. X-ray photoelectron spectroscopy (XPS) combined with standing-wave excitation (SW-XPS), a fairly new method in the EUV lithography field, previously had been largely applied in multilayers and superlattices for characterizing the composition and electronic structure of buried layers and interfaces as a function of depth. We applied the SW-XPS method to organic/inorganic photoresists to provide depth-selective information on their structural and chemical conditions of as a function of temperature, EUV exposure, different underlayers, and other fundamental parameters. As a first attempt, we perform an SW-XPS feasibility study on self-assembled monolayer (SAM) films after exposure to an electron beam. By SW-XPS, we determined that the interface between the Al 2 O 3 underlayer and the SAMs is smooth, with a mean roughness of about 0.2 nm. Moreover, we determined that the SAM chains are, on average, tilted by 1/430 deg off the sample normal. The SW-XPS results also suggest that the SAM is not a perfectly aligned and uniform monolayer, with some areas having thickness higher than a single monolayer. We demonstrated that SW-XPS can provide useful information on ultrathin materials with high potential for being used as a characterization method of organic/inorganic photoresists.

36 MATERIALS SCIENCE↗

Additive Lithography–Organic Monolayer Patterning Coupled with an Area-Selective Deposition

The combination of area-selective deposition (ASD) with a patternable organic monolayer provides a versatile additive lithography platform, enabling the generation of a variety of nanoscale feature geometries. Stearate hydroxamic acid self-assembled monolayers (SAMs) were patterned with extreme ultraviolet (λ = 13.5 nm) or electron beam irradiation and developed with ASD to achieve line space patterns as small as 50 nm. Density functional theory was employed to aid in the synthesis of hydroxamic acid derivatives with optimized packing density to enhance the imaging contrast and improve dose sensitivity. Near-edge X-ray absorption fine structure spectroscopy and infrared spectroscopy reveal that the imaging mechanism is based on improved deposition inhibition provided by the cross-linking of the SAM to produce a more effective barrier during a subsequent deposition step. With patterned substrates composed of coplanar copper lines and silicon spacers, hydroxamic acids selectively formed monolayers on the metal portions and could undergo a pattern-wise exposure followed by ASD in the first combination of a patternable monolayer with ASD. This material system presents an additional capability compared to traditional ASD approaches that generally reflect a starting patterned surface. Finally, this bottoms-up additive approach to lithography may be a viable alternative to subtractive nanoscale feature generation.

37 INORGANIC, ORGANIC, PHYSICAL, AND ANALYTICAL CH↗

Spatial nematic fluctuation in BaFe 2 (As 1-x P x ) 2 revealed by spatially and angle-resolved photoemission spectroscopy

Nematicity, where rotational symmetry is broken while translational symmetry is conserved, is prevalent in higherature superconductors. In particular, nematic quantum critical point has been universally found near the optimum doping of the superconducting dome of several iron-based superconductor families. In such a regime, evidence for strong nematic fluctuations have been observed. As the precursor to this order, nematic fluctuations emerge before nematicity, providing favorable ground to study how nematic order modifies the electronic structure in the absence of structural distortion. Here we use spatially resolved angle-resolved photoemission spectroscopy to investigate the correlation between the onset of nematic fluctuations and electronic structure in an optimally doped BaFe 2 (As 1-x P x )2 (x ~ 0.3) superconductor. We reveal a strong spatially varying anisotropy of the Fermi surface on a length scale of tens of microns with strong correlation between the changes in the hole and electron Fermi pockets, consistent with the variations expected in the presence of fluctuating nematic order. These results provide direct evidence for spatial nematic fluctuations in the optimal doping regime of iron-based superconductors.

75 CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND↗

Analytical and Experimental Studies of Leak Location and Environment Characterization for the International Space Station

The International Space Station program is developing a robotically-operated leak locator tool to be used externally. The tool would consist of a Residual Gas Analyzer for partial pressure measurements and a full range pressure gauge for total pressure measurements. The primary application is to detect NH3 coolant leaks in the ISS thermal control system.An analytical model of leak plume physics is presented that can account for effusive flow as well as plumes produced by sonic orifices and thruster operations. This model is used along with knowledge of typical RGA and full range gauge performance to analyze the expected instrument sensitivity to ISS leaks of various sizes and relative locations (directionality).The paper also presents experimental results of leak simulation testing in a large thermal vacuum chamber at NASA Goddard Space Flight Center. This test characterized instrument sensitivity as a function of leak rates ranging from 1 lbmyr. to about 1 lbmday. This data may represent the first measurements collected by an RGA or ion gauge system monitoring off-axis point sources as a function of location and orientation. Test results are compared to the analytical model and used to propose strategies for on-orbit leak location and environment characterization using the proposed instrument while taking into account local ISS conditions and the effects of ramwake flows and structural shadowing within low Earth orbit.

Leak Locator↗

Analytical and Experimental Studies of Leak Location and Environment Characterization for the International Space Station

The International Space Station program is developing a robotically-operated leak locator tool to be used externally. The tool would consist of a Residual Gas Analyzer for partial pressure measurements and a full range pressure gauge for total pressure measurements. The primary application is to detect NH3 coolant leaks in the ISS thermal control system. An analytical model of leak plume physics is presented that can account for effusive flow as well as plumes produced by sonic orifices and thruster operations. This model is used along with knowledge of typical RGA and full range gauge performance to analyze the expected instrument sensitivity to ISS leaks of various sizes and relative locations ("directionality"). The paper also presents experimental results of leak simulation testing in a large thermal vacuum chamber at NASA Goddard Space Flight Center. This test characterized instrument sensitivity as a function of leak rates ranging from 1 lb-mass/yr. to about 1 lb-mass/day. This data may represent the first measurements collected by an RGA or ion gauge system monitoring off-axis point sources as a function of location and orientation. Test results are compared to the analytical model and used to propose strategies for on-orbit leak location and environment characterization using the proposed instrument while taking into account local ISS conditions and the effects of ram/wake flows and structural shadowing within low Earth orbit.

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