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Mateo Batkis

Publications and source records attributed to Mateo Batkis.

8 records
All sourcesNASA NTRSDOE OSTI
NASA NTRSDate not supplied

A New Linear Polarizer Design for Application in the Far-Ultraviolet Spectral Range

New mission concepts that are under consideration by NASA (such as the Polstar MIDEX mission concept) call for the design and implementation of Far Ultraviolet (FUV) polarizer technologies that have not been developed yet. A team that includes members from the NASA Goddard Space Flight Center (GSFC), Arizona State University (ASU), and Woodruff Consulting, worked on the design and development of a polarizer design that may produce extinction ratios higher than have ever been reported before in the FUV spectral range (100-200 nm). This polarizer consists of transmitting linearly polarized light through a series of reflections from a combination of two silicon carbide (SiC) and two lithium fluoride (LiF) crystals positioned at angles of incidence (relative to surface normal) close to the LiF Brewster’s angle. The performance of this polarizer concept was fabricated and tested with an existing McPherson 225 Vacuum Ultraviolet (VUV) spectrometer located in the Optics Branch at NASA-GSFC. Initial testing has shown that in the FUV spectral range, this design can produce state-of-the-art extinction ratios at the Hydrogen Lyman-Alpha (Ly-α) wavelength of 121.6 nm. A polarizer with such a performance has never been reported and it signifies a breakthrough in FUV polarization technology. The levels of effectiveness paired with the design’s compact design allows for a new polarizer capability that would one day be implemented in a future spectropolarimetry space mission. In addition, this polarizer concept could potentially be used to characterize the optical properties of new mirror coatings that will be used in a future Habitable World Observatory (HWO) mission concept as proposed by the 2020 Decadal Survey.2

Far Ultraviolet (FUV), polarimetry, instrumentatio↗
NASA NTRSDate not supplied

Linear Polarizer Design for Application in the Far-Ultraviolet Spectral Range

New mission concepts that are under consideration by NASA (such as the Polstar MIDEX mission concept) call for the design and implementation of Far Ultraviolet (FUV) polarizer technologies that have not been developed yet. A team that includes members from the NASA Goddard Space Flight Center (GSFC), Arizona State University (ASU), and Woodruff Consulting, worked on the design and development of a polarizer design that may produce extinction ratios higher than have ever been reported before in the FUV spectral range (100-200 nm). This polarizer consists of transmitting linearly polarized light through a series of reflections from a combination of two silicon carbide (SiC) and two lithium fluoride (LiF) crystals positioned at angles of incidence (relative to surface normal) close to the LiF Brewster’s angle. The performance of this polarizer concept was fabricated and tested with an existing McPherson 225 Vacuum Ultraviolet (VUV) spectrometer located in the Optics Branch at NASA-GSFC. Initial testing has shown that in the FUV spectral range, this design can produce state-of-the-art extinction ratios at the Hydrogen Lyman-Alpha (Ly-α) wavelength of 121.6 nm. A polarizer with such a performance has never been reported and it signifies a breakthrough in FUV polarization technology. The levels of effectiveness paired with the design’s compact design allows for a new polarizer capability that would one day be implemented in a future spectropolarimetry space mission. In addition, this polarizer concept could potentially be used to characterize the optical properties of new mirror coatings that will be used in a future Habitable World Observatory (HWO) mission concept as proposed by the 2020 Decadal Survey.2

Far Ultraviolet (FUV), polarimetry, instrumentatio↗
NASA NTRSDate not supplied

Environmental and Polarization Characterizations of E-Beam Plasma-Based AlF 3 -Passivated Aluminum Mirrors for Astronomical Telescopes

Astronomical space telescopes to study astrophysical phenomena from the far ultraviolet (FUV) to the near infrared (NIR) will require mirror coatings with high reflectance over this entire spectral region. While coatings for the optical and NIR part of the spectrum are fairly well developed with proven performance, the FUV range has presented significant challenges, particularly below 120nm. Recent developments in electron-beam (e-Beam) generated plasma treatment in a SF 6 environments has enabled the effective passivation of aluminum (Al) coatings for applications in the FUV, by native oxide removal and the formation of a AlF 3 passivation layer which could be tuned to any desired AlF 3 thickness. These results have been produced through a collaboration between the Goddard Space Flight Center (GSFC) and the Naval Research Laboratory (NRL). The passivation experiments have been carried out using the Large Area Plasma Processing System (LAPPS) at NRL using bare aluminum samples and provided by the coating group at GSFC. This novel procedure has demonstrated improved Al mirrors with state-of-the-art FUV reflectivity (e.g. R=91% at 121.6nm). In this paper, we will be reporting on environmental testing, micro-roughness, as well as polarization studies of these E-beam treated samples. These characterizations are being done in order to advance the Technology Readiness Level (TRL) for these Al+AlF 3 mirror coatings produced at LAPPS. The ultimate goal is to demonstrate the promise of using this coating technology to deliver reflectance performance plus stability and uniformity over a large area for a future IR/O/UV space telescope observatory.

FUV reflectance↗
NASA NTRSDate not supplied

Linear Polarizer Design for Application in the Far-Ultraviolet Spectral Range

New mission concepts that are under consideration by NASA call for the design and implementation of Far Ultraviolet (FUV) polarizer technologies that have not been developed yet. A team that includes members from the NASA Goddard Space Flight Center (GSFC), Arizona State University (ASU), and Woodruff Consulting, worked on the design and development of a polarizer design that produce very high extinction ratios in the FUV spectral range (100-200 nm). This polarizer consists of reflecting light through a series of mirrors from a combination of two silicon carbide (SiC) and two lithium fluoride (LiF) crystals positioned at angles of incidence (relative to surface normal) close to the average LiF Brewster’s angle in the FUV. The output is a highly linearly polarized beam. This polarizer concept was fabricated and tested in the existing McPherson 225 Vacuum Ultraviolet (VUV) spectrometer located in the Optics Branch at NASA-GSFC. Initial testing using a MgF2 crystal at the Brewster’s angle as an analyzer has shown that this design can produce state-of-the-art extinction ratios at the Hydrogen Lyman-Alpha (Ly-α) wavelength of 121.6 nm, and that the measured extinction ratio of the two crossed polarizers, ≈114, is mostly limited by the MgF2 analyzer. A polarizer with such a performance at this wavelength has never been reported and it signifies a breakthrough in FUV polarization technology. The levels of effectiveness paired with the polarizer’s compact design allows for a new polarizer capability that would one day be implemented in a future FUV spectropolarimetry space mission.

Far Ultraviolet (FUV)↗
NASA NTRSDate not supplied

Metrological and Spectral Characterization of the Aspera Flight Optics

Aspera is a NASA's Astrophysics Pioneers mission, led by the University of Arizona. The aim of this mission is to study the presence of hot gasses (T=10^5-10^6 K) in the circumgalactic medium (CGM) and how the flow of these gasses affects galactic formation. One key enabling technology in the Aspera optical system is the use of more efficient UV-reflective optical coatings particularly at around 103.2 nm where the O VI emission line is located . In order to meet radiometric effective area requirements, the Goddard Space Flight Center (GSFC) code 551 Optics Branch applied Al (aluminum) + eLiF (enhanced lithium fluoride) on these optics, where the Al+LiF is annealed at elevated temperature (~250˚C) after the deposition and thus providing an improved version of the Al+LiF used in FUSE . Furthermore, these optics are encapsulated with a thin film of atomic layer deposited MgF2 at the Jet Propulsion Laboratory for enhanced durability . The efficiency and durability of these coatings depends on the quality of the optical surface in terms of cleanliness and roughness. Roughness increases the scatter off the coating and reduces the specular reflectance, and surface contaminants can accommodate moisture and other contaminants, increase scattering, and are weak points in the coating that may affect adhesion and subsequently the longevity of these coatings. Extensive optical metrology is necessary to minimize and quantify the impact of surface roughness and contaminants on optical surfaces. In this proceeding we report the inspection procedure implemented for Aspera optics at GSFC, from initial receiving of the optics to post-coating. Inspection includes Atomic Force Microscopy (AFM), Scanning White Light Interferometry (SWILI), Dark Field Microscopy (DFM), Phase Shifting Interferometry (PSI), and Vacuum ultraviolet (VUV) spectroscopy. Combinations of these techniques are used to inspect flight optics at each of the following steps: i) as-received, pre-cleaning inspection, ii) pre-coating, post-cleaning inspection, and iii) post-coating inspection. The evolution of roughness and other surface inspections such as contaminants are compared between each step to quantify the effect each step has on the flight optics. The final far ultraviolet (FUV) spectral performance of witness samples coated with the flight optics are presented.

Far Ultraviolet (FUV)↗