Engineering topics

McKinney, Wayne R

Publications and source records attributed to McKinney, Wayne R.

8 records

DOE OSTI2013

Test surfaces useful for calibration of surface profilometers

The present invention provides for test surfaces and methods for calibration of surface profilometers, including interferometric and atomic force microscopes. Calibration is performed using a specially designed test surface, or the Binary Pseudo-random (BPR) grating (array). Utilizing the BPR grating (array) to measure the power spectral density (PSD) spectrum, the profilometer is calibrated by determining the instrumental modulation transfer.

47 OTHER INSTRUMENTATION↗

DOE OSTI2011

Calibration of the modulation transfer function of surface profilometers with binary pseudo-random test standards: expanding the application range

A modulation transfer function (MTF) calibration method based on binary pseudo-random (BPR) gratings and arrays [Proc. SPIE 7077-7 (2007), Opt. Eng. 47, 073602 (2008)] has been proven to be an effective MTF calibration method for a number of interferometric microscopes and a scatterometer [Nucl. Instr. and Meth. A616, 172 (2010)]. Here we report on a further expansion of the application range of the method. We describe the MTF calibration of a 6 inch phase shifting Fizeau interferometer. Beyond providing a direct measurement of the interferometer's MTF, tests with a BPR array surface have revealed an asymmetry in the instrument's data processing algorithm that fundamentally limits its bandwidth. Moreover, the tests have illustrated the effects of the instrument's detrending and filtering procedures on power spectral density measurements. The details of the development of a BPR test sample suitable for calibration of scanning and transmission electron microscopes are also presented. Such a test sample is realized as a multilayer structure with the layer thicknesses of two materials corresponding to BPR sequence. The investigations confirm the universal character of the method that makes it applicable to a large variety of metrology instrumentation with spatial wavelength bandwidths from a few nanometers to hundreds of millimeters.

42 ENGINEERING↗

DOE OSTI2010

Development of in situ, at-wavelength metrology for soft x-ray nano-focusing

At the Advanced Light Source (ALS), we are developing broadly applicable, high-accuracy, in situ, at-wavelength wavefront slope measurement techniques for Kirkpatrick-Baez (KB) mirror nano-focusing. We describe here details of the metrology beamline endstation, the at-wavelength tests, and an original alignment method that have already allowed us to precisely set a bendable KB mirror to achieve a FWHM focused spot size of ~;;120 nm, at 1-nm soft x-ray wavelength.

47 OTHER INSTRUMENTATION↗

DOE OSTI2010

Characterization of electron microscopes with binary pseudo-random multilayer test samples

Verification of the reliability of metrology data from high quality x-ray optics requires that adequate methods for test and calibration of the instruments be developed. For such verification for optical surface profilometers in the spatial frequency domain, a modulation transfer function (MTF) calibration method based on binary pseudo-random (BPR) gratings and arrays has been suggested [Proc. SPIE 7077-7 (2007), Opt. Eng. 47(7), 073602-1-5 (2008)} and proven to be an effective calibration method for a number of interferometric microscopes, a phase shifting Fizeau interferometer, and a scatterometer [Nucl. Instr. and Meth. A 616, 172-82 (2010)]. Here we describe the details of development of binary pseudo-random multilayer (BPRML) test samples suitable for characterization of scanning (SEM) and transmission (TEM) electron microscopes. We discuss the results of TEM measurements with the BPRML test samples fabricated from a WiSi2/Si multilayer coating with pseudo randomly distributed layers. In particular, we demonstrate that significant information about the metrological reliability of the TEM measurements can be extracted even when the fundamental frequency of the BPRML sample is smaller than the Nyquist frequency of the measurements. The measurements demonstrate a number of problems related to the interpretation of the SEM and TEM data. Note that similar BPRML test samples can be used to characterize x-ray microscopes. Corresponding work with x-ray microscopes is in progress.

46 INSTRUMENTATION RELATED TO NUCLEAR SCIENCE AND ↗

DOE OSTI2010

Development of a new generation of optical slope measuring profiler

A collaboration, including all DOE synchrotron labs, industrial vendors of x-ray optics, and with active participation of the HBZ-BESSY-II optics group has been established to work together on a new slope measuring profiler -- the optical slope measuring system (OSMS). The slope measurement accuracy of the instrument is expected to be<50 nrad for the current and future metrology of x-ray optics for the next generation of light sources. The goals were to solidify a design that meets the needs of mirror specifications and also be affordable; and to create a common specification for fabrication of a multi-functional translation/scanning (MFTS) system for the OSMS. This was accomplished by two collaborative meetings at the ALS (March 26, 2010) and at the APS (May 6, 2010).

46 INSTRUMENTATION RELATED TO NUCLEAR SCIENCE AND ↗

DOE OSTI2010

Cross-check of ex-situ and in-situ metrology of a bendable temperature stabilized KB mirror

At the Advanced Light Source (ALS), we are developing broadly applicable, high-accuracy, in-situ, at-wavelength wavefront slope measurement techniques for Kirkpatrick-Baez (KB) mirror nano-focusing. In this paper, we report an initial cross-check of ex-situ and in-situ metrology of a bendable temperature stabilized KB mirror. This cross-check provides a validation of the in-situ shearing interferometry currently under development at the ALS.

47 OTHER INSTRUMENTATION↗

DOE OSTI2010

Studies in Optimal Configuration of the LTP

Brightness preservation requirements for ever brighter synchrotron radiation and free electron laser beamlines require surface slope tolerances of x-ray optics on the order of 0.2 mu rad, or better. Hence, the accuracy of dedicated surface slope metrology must be 0.1 mu rad, or even less. Achieving this level of measurement accuracy with the flagship instrument at synchrotron radiation metrology laboratories, the Long Trace Profiler (LTP), requires all significant sources of systematic, random, and instrumental drift errors to be identified, and reduced or eliminated. In this respect, the performance of certain components of the Advanced Light Source LTP-II design [Kirschman, et al., Proc. SPIE, 7077, 70770A-12 (2008)] is analyzed, considering the principal justification for inclusion of each component, possible systematic error due to the quality of its optical material, and drift effects due to generated heat, etc. We investigate the effects of replacement of the existing diode laser with a fiber-coupled laser light source, and demonstrate that reducing the number of components by using a single beam on the surface under test (SUT), rather than an original double beam maintains, or even improves the accuracy of measurement with our LTP. Based on the performance of the upgraded LTP, we trace the further steps for improving of the LTP optical system.

47 OTHER INSTRUMENTATION↗

DOE OSTI2010

Calibration of the modulation transfer function of surface profilometers with binary pseudo-random test standards: Expanding the application range

A modulation transfer function (MTF) calibration method based on binary pseudo-random (BPR) gratings and arrays [Proc. SPIE 7077-7 (2007), Opt. Eng. 47(7), 073602-1-5 (2008)] has been proven to be an effective MTF calibration method for a number of interferometric microscopes and a scatterometer [Nucl. Instr. and Meth. A 616, 172-82 (2010]. Here we report on a significant expansion of the application range of the method. We describe the MTF calibration of a 6 inch phase shifting Fizeau interferometer. Beyond providing a direct measurement of the interferometer's MTF, tests with a BPR array surface have revealed an asymmetry in the instrument's data processing algorithm that fundamentally limits its bandwidth. Moreover, the tests have illustrated the effects of the instrument's detrending and filtering procedures on power spectral density measurements. The details of the development of a BPR test sample suitable for calibration of scanning and transmission electron microscopes are also presented. Such a test sample is realized as a multilayer structure with the layer thicknesses of two materials corresponding to BPR sequence. The investigations confirm the universal character of the method that makes it applicable to a large variety of metrology instrumentation with spatial wavelength bandwidths from a few nanometers to hundreds of millimeters.

47 OTHER INSTRUMENTATION↗