Engineering topics

Miyakawa, Ryan H.

Publications and source records attributed to Miyakawa, Ryan H..

4 records

DOE OSTI2018

Lateral shearing interferometry for high-NA EUV wavefront metrology

Copyright © 2018 SPIE. We present a lateral shearing interferometer suitable for high-NA EUV wavefront metrology. In this interferometer, a geometric model is used to accurately characterize and predict systematic errors that come from performing interferometry at high NA. This interferometer is compatible with various optical geometries, including systems where the image plane is tilted with respect to the optical axis, as in the Berkeley MET5. Simulation results show that the systematic errors in tilted geometries can be reduced by aligning the shearing interferometer grating and detector parallel to the image plane. Subsequent residual errors can be removed by linear fitting.

Zhu, Wenhua↗

DOE OSTI2017

Efficient Fresnel zoneplate pattern data preparation for high-resolution nanofabrication

A Fresnel zoneplate is a diffractive optical element consisting of concentric rings (zones) for which the transmitted light produces a focal spot that is used in all wavelength regimes, including X-rays. The pattern of transmission openings determines the location of the spot and the sub-half wavelength size of the openings can adjust the intensity. Today, very general transmission zoneplate patterns are used for many special imaging and image compensation purposes. Manufacturing zoneplates require a zoneplate pattern file, which precisely describes the size, shape, and contour of the rings based on the desired optical properties of the lens. Generating such a pattern requires the delicate balance of achieving the required optical performance while maintaining manageable file sizes and computation times. Here we describe a new algorithm meeting these needs. In conclusion, by precisely controlling the number of shapes in each zone, the algorithm simultaneously optimizes the desired optical tolerances with the pattern file size.

47 OTHER INSTRUMENTATION↗

DOE OSTI2016

Emulation of anamorphic imaging on the SHARP extreme ultraviolet mask microscope

The SHARP high-numerical aperture actinic reticle review project is a synchrotron-based, extreme ultraviolet (EUV) microscope dedicated to photomask research. SHARP emulates the illumination and imaging conditions of current EUV lithography scanners and those several generations into the future. An anamorphic imaging optic with increased mask-side numerical aperture (NA) in the horizontal and increased demagnification in the vertical direction has been proposed in this paper to overcome limitations of current multilayer coatings and extend EUV lithography beyond 0.33 NA. Zoneplate lenses with an anamorphic 4×/8× NA of 0.55 are fabricated and installed in the SHARP microscope to emulate anamorphic imaging. SHARP’s Fourier synthesis illuminator with a range of angles exceeding the collected solid angle of the newly designed elliptical zoneplates can produce arbitrary angular source spectra matched to anamorphic imaging. A target with anamorphic dense features down to 50-nm critical dimension is fabricated using 40 nm of nickel as the absorber. In a demonstration experiment, anamorphic imaging at 0.55 4×/8× NA and 6 deg central ray angle (CRA) is compared with conventional imaging at 0.5 4× NA and 8 deg CRA. A significant contrast loss in horizontal features is observed in the conventional images. Finally, the anamorphic images show the same image quality in the horizontal and vertical directions.

36 MATERIALS SCIENCE↗

DOE OSTI2014

A broader view on EUV-masks: adding complementary imaging modes to the SHARP microscope

The authors are expanding the capabilities of the SHARP microscope by implementing complementary imaging modes. SHARP (the SEMATECH High-NA Actinic Reticle review Project) is an actinic, synchrotron-based microscope dedicated to extreme ultraviolet (EUV) photomask research. SHARP’s programmable Fourier Synthesis Illuminator and its use of Fresnel zoneplate lenses as imaging optics provide a versatile framework, facilitating the implementation of diverse modes beyond conventional imaging. In addition to SHARP’s set of standard zoneplates, we have created more than 100 zoneplates for complementary imaging modes, all designed to extract additional information from photomasks, improve navigation and enhance defect detection. More than 50 new zoneplates are installed in the tool; the remaining lenses are currently in production. Here in this paper we discuss the design and fabrication of zoneplates for complementary imaging modes and present image data, obtained using Zernike Phase Contrast and different implementations of Differential Interference Contrast.

36 MATERIALS SCIENCE↗