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Nguyen, S.

Publications and source records attributed to Nguyen, S..

X-Ray Exposure of Electron-Deposited Photoresist for Conformal Lithography on Corrugated Surfaces

Proximity printing using synchrotron X-ray lithography provides high resolution pattern transfer with large depth of field, low diffraction effects and no reflection from the substrate. Electro-plating of photo-resist allows deposition of thin, uniform films over geometrically complex and topographically diverse, electrically conductive surfaces.

Electron-deposited resist X-ray lithography Deep d↗