Nichols, Jake H. [Oak Ridge National Laboratory (ORNL), Oak Ridge, TN (United States)] (ORCID:0000000196292252)

DOE OSTI2026

First Wall Design of a Tokamak Pilot Plant Using a Monte Carlo Model for 3-D Heat Flux Deposition

We present a method for calculating the heat fluxes deposited on nonaxisymmetric tokamak first wall components, allowing for a first-of-its-kind model for power handling in the tokamak far scrape-off layer (SOL). The DIV3D Monte Carlo model features strict global power conservation and can calculate the finite cross-field plasma transport into magnetically-shadowed regions, which is significant when dealing with meter-scale shadows introduced by components such as poloidal limiters or antennas. As a case study, we apply the DIV3D model to inform the distribution of first wall poloidal limiters in an ARC-class reactor device. We demonstrate that discrete protection limiters can efficiently reduce peak heat fluxes on recessed breeder wall components in the presence of significant far-SOL plasma fluxes. By varying the toroidal periodicity and radial standoff depth of the limiters, we demonstrate one of the tradeoffs that must be considered in first wall design: more limiters provide greater protection, but at the cost of reduced breeding performance. We also present the impact that radial misalignments between limiters would have on first wall power loading.

Monte Carlo methods↗

DOE OSTI2025

Erosion of high-Z refractory coatings for helicon plasma source window

Proto-MPEX (Materials Plasma Exposure eXperiment), a linear plasma device (LPD), using a high power radio frequency (RF) (⩾100 kW, 13.56 MHz) helicon plasma source, has suffered RF sheath-induced window erosion. The sputtered impurities from the window surface transport toward the downstream target affecting plasma-material interaction studies. The rectified sheath voltage formed was high enough to cause window erosion by light ions due to its low-Z components (e.g. Si 3 N 4 and AlN). Hence, we are proposing impurity mitigation strategies, which involve the application of a Faraday screen to lower the rectified sheath voltage and the application of high-Z refractory coatings on the existing window plasma-facing surface. In this work, we report the erosion of two different coatings, i.e., tantalum oxide (Ta 2 O 5 ) and hafnium oxide (HfO 2 ) on a silicon nitride (Si 3 N 4 ) window material under conditions of low-energy deuterium (D) ion impact, well below the Ta 2 O 5 sputtering energy threshold (i.e. 250 eV). The test samples were RF-biased and exposed to a high D-ion fluence (∼10 26 m −2 ) in Plasma Interaction with Surface Component Experimental Station (PISCES-A) LPD. The experimentally measured sputtering yields of the high-Z refractory coatings below the sputtering energy threshold of Ta 2 O 5 indicate an increased erosion due to the plasma impurities, especially due to oxygen. Improving the vacuum level could reduce the oxygen impurities and increase the lifespan of the coated helicon window for plasma operation. Post-surface analysis indicates no preferential erosion of oxygen or enrichment of the high-Z surface component. This is likely due to an effective energy transfer from the impurity ion for sputtering of the high-Z component in the coating. With the reduced rectified sheath voltage at the window surface and improved vacuum conditions, the proposed high-Z refractory coatings offer a promising solution for reducing window erosion in future MPEX plasma operations at ORNL.

RF bias↗