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Paganin, D. M.

Publications and source records attributed to Paganin, D. M..

Optimization of in-line phase contrast particle image velocimetry using a laboratory x-ray source

Phase contrast particle image velocimetry (PIV) using a laboratory x-ray microfocus source is investigated using a numerical model. Phase contrast images of 75 {mu}m air bubbles, embedded within water exhibiting steady-state vortical flow, are generated under the paraxial approximation using a tungsten x-ray spectrum at 30 kVp. Propagation-based x-ray phase-contrast speckle images at a range of source-object and object-detector distances are generated, and used as input into a simulated PIV measurement. The effects of source-size-induced penumbral blurring, together with the finite dynamic range of the detector, are accounted for in the simulation. The PIV measurement procedure involves using the cross-correlation between temporally sequential speckle images to estimate the transverse displacement field for the fluid. The global error in the PIV reconstruction, for the set of simulations that was performed, suggests that geometric magnification is the key parameter for designing a laboratory-based x-ray phase-contrast PIV system. For the modeled system, x-ray phase-contrast PIV data measurement can be optimized to obtain low error (<0.2 effective pixel of the detector) in the system with magnification lying in the range between 1.5 and 3. For large effective pixel size (>15 {mu}m) of the detector, high geometric magnification (>2.5) is desired, while for large source size system (FWHM > 30 {mu}m), low magnification (<1.5) would be suggested instead. The methods developed in this paper can be applied to optimizing phase-contrast velocimetry using a variety of laboratory x-ray sources.

71 CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSIC↗

Electron caustic lithography

A maskless method of electron beam lithography is described which uses the reflection of an electron beam from an electrostatic mirror to produce caustics in the demagnified image projected onto a resist-coated wafer. By varying the electron optics, e.g. via objective lens defocus, both the morphology and dimensions of the caustic features may be controlled, producing a range of bright and tightly focused projected features. The method is illustrated for line and fold caustics and is complementary to other methods of reflective electron beam lithography.

43 PARTICLE ACCELERATORS↗