Engineering topics

Rapp, Juergen

Publications and source records attributed to Rapp, Juergen.

7 records

DOE OSTI2024

Research and Development to Reduce Impurity Production and Transport of the Impurities to the Target in Linear Plasma Devices Using Helicon Plasma Sources

Linear plasma devices used to test plasma facing materials (PFMs) and components for fusion reactors are often suffering under the production of intrinsic impurities from the plasma source system. Most linear plasma devices use internal electrodes (hollow cathodes, reflex arc, or cascading arc), which typically are the source of the main impurities. The next-generation plasma generators use radio frequency (RF) plasma sources like helicons to avoid internal electrodes. However, high power operation of helicons has proven to result in impurity production due to the high rectified sheath voltages created. Depending on the plasma parameters and magnetic configuration, these impurities can be transported to the target and deposited there to unacceptable high levels. Here, in this contribution, the experimental results from Proto-MPEX are summarized, and the conclusions of the impurity source physics are given. Methods to reduce the impurity production, the impurity transport, and the net deposition on the target are presented. These methods to reduce the impurity production include Faraday screens to reduce the sheath voltage drop, high-Z refractory coatings to reduce the erosion yield, and wall conditioning methods. Methods to reduce the impurity transport include changes in the magnetic configuration as well as electron heating to change axial and radial temperature profiles. Preliminary results on the effectiveness of some of these methods are presented.

70 PLASMA PHYSICS AND FUSION TECHNOLOGY↗

DOE OSTI2024

Impurity transport in PISCES-RF

Linear plasma devices (LPD) utilizing a helicon plasma source, a high density light ion source, can generate impurities due to progressive erosion of the radio frequency (RF) transmission window caused by rectified sheath voltage. These source-born impurities can entrain and be transported by the plasma toward a target, affecting plasma-material interaction studies. Earlier work on material testing in Prototype-Materials Plasma Exposure eXperiment at ORNL revealed significant source impurity deposition on downstream targets. However, using a similar RF source, no target impurity deposition is observed in Plasma Interaction Surface Component Experimental Station (PISCES)-RF despite evidence of RF window erosion in the source region, thereby motivating the present work. Experimentally, using various magnetic field configurations upstream of the PISCES-RF plasma source and seeding titanium (Ti) impurities at various axial locations, impurity transport and deposition along the machine axis were investigated. It was found that Ti deposition was localized to the side of the plasma source where the Ti impurity was seeded. In contrast, aluminum (Al) deposition, originating from the sputtering of the helicon window, occurred predominantly upstream of the plasma source, suggesting an asymmetry in the axial transport of eroded RF window material. These observations suggest a stagnation of the parallel plasma flow immediately downstream of the plasma source, with impurity ions remaining unmagnetized near the source upstream. Al deposition in magnetic field-free regions in PISCES-RF indicates that sputtered Al impurities likely remained neutral due to their large ionization mean-free path under PISCES-RF conditions. Plasma modeling and simulation supported this, indicating that Al-neutrals transport toward the helicon source upstream for low electron density cases. It was found that the Larmor radius of the Al ions was greater than the plasma radius towards the source upstream and remained weakly magnetized in PISCES-RF, meaning that plasma source-born impurities are not efficiently entrained in the plasma flow. These findings provide critical insights into impurity transport in helicon plasma-based LPDs.

70 PLASMA PHYSICS AND FUSION TECHNOLOGY↗

DOE OSTI2024

Observation of tantalum deposition and growth on TiB2 and ZrB2 from PISCES-RF deuterium and helium plasma exposures

Deuterium and helium plasma exposures on bulk TiB2 and ZrB2 samples were performed using the PISCES-RF linear plasma device. 40 and 90 eV deuterium ion plasma exposures were performed at 240 and 800 °C sample temperatures, and 80 eV helium ion plasma exposures were performed at 800 °C sample temperatures. Following plasma exposures, it was discovered that two plasma conditions (90 eV deuterium and 80 eV helium at 800 °C) resulted in thick (>200 nm) tantalum-rich (>10 at%) surface features on the targets, presumably from tantalum sourced from a tantalum adapter mask or cap used as part of the target holder. This work aims to characterize these tantalum-rich features and examine the mechanisms of impurity deposition.Plasma-induced surface morphology of the tantalum-rich surface layers depends on plasma properties and target temperature and chemistry. Greater titanium sputtering compared to zirconium resulted in more distinct surface features in the TiB2 samples compared to the ZrB2 samples via increased, prompt deposition onto tantalum surface impurities. There is still uncertainty as to why thick tantalum deposition only occurred under some plasma exposure conditions but not others; it is likely due to tantalum sputtering by a combination of boron molecules from the targets and carbon-impurities in the tantalum mask or targets. Impurity driven surface features are a well-documented phenomena in samples exposed to plasma from linear plasma device facilities—this work confirms the occurrence of this and emphasizes the need for chemistry characterization of isolated post-mortem surface features in plasma-exposed samples.

Nuckols, Lauren↗

DOE OSTI2023

Crystallographic and temperature effects in low-energy collisions for plasma–material interactions

The interaction of plasma with materials is critical for the fundamental understanding of non-equilibrium processes and their wide application. Recent achievements in fusion energy research emphasize the importance of this problem. Because modelling and predicting plasma–material interactions (PMI) require considering a tremendous number of single plasma particle–surface interaction events, this type of modelling was, until recently, possible only within a binary collision approximation (BCA). The BCA approach considers materials as uniform temperature-insensitive media. The research presented here addresses the PMI problem within an atomistic-based approach for the first time at a statistically significant level. Approximately 10 5 molecular dynamics trajectories were generated for 100 eV deuterium ions interacting with a tungsten surface. The research demonstrated the critical importance of incorporating the discrete lattice structure of matter into the model. Deuterium penetration depth and fraction of backscattered deuterium ions strongly depend on the surface orientation, the impact incident ion directions, and the ions’ initial positions. On average, the BCA-based calculations underestimate the penetration depth by a factor of two or more, and the fraction of backscattered atoms is overestimated by a factor of two or more. As a result, increasing the material temperature from 500 to 3000 K reduces penetration depth by about 30% and increases the fraction of backscattered atoms by 250%.

36 MATERIALS SCIENCE↗

DOE OSTI2023

Analysing the effects of heating and gas puffing in Proto-MPEX helicon and auxiliary heated plasmas

The Material Plasma Exposure Experiment (MPEX) is being constructed at Oak Ridge National Laboratory to investigate critical fusion reactor issues, such as plasma–material interactions (PMIs) under reactor-relevant conditions and time scales. The linear device Proto-MPEX was used as a test bed to address anticipated research and development issues associated with heating scenarios and establish the physics basis for MPEX. The SOLPS-ITER code suite has been applied to understand plasma and neutral transport in Proto-MPEX and to increase confidence in predictive simulations for MPEX. Coupling between COMSOL and SOLPS is performed to implement a 2D electron heating profile of the helicon source. The simulations show reasonable agreement with the experimental data for plasma with helicon and auxiliary electron cyclotron heating (ECH). Both Bohm and constant diffusion (D$_\perp$: 0.5 m 2 s –1 and $\chi_\perp$: 1 m 2 s –1 ) simulations show similar levels of agreement with respect to the sparse experimental data available, assuming a few per cent impurity concentration. ECH significantly increases the target electron temperature, however, the target electron density is reduced compared to helicon-only heated plasmas due to an increase in flow velocity and radial losses. The simulations show that further increasing the ECH power results in an increase in the target electron density due to increased recycling flux and ionization. The results indicate that ECH significantly enhances the target heat flux, with ECH power of 50 kW increasing the target heat flux from 0.4 to 17 MW m –2 . It is found that a small amount of gas puffing (GP) near the target plate can further increase the target heat fluxes at the higher ECH power cases, but the target heat flux is reduced at higher GP conditions due to a significant reduction in electron temperature via radiation. ECH and GP scenarios can generate a higher target flux, facilitating improved PMI studies with more reactor-relevant plasma conditions.

70 PLASMA PHYSICS AND FUSION TECHNOLOGY↗

DOE OSTI2023

Plasma production and ion heating systems for the Material Plasma Exposure eXperiment

Plasma production and ion heating in the Material Plasma Exposure eXperiment (MPEX), whose design is nearing completion, is accomplished using continuous wave RF power with average power density up to 1.6 MW/m2 at the plasma interface. Plasma is produced using helicon waves coupled through a single helical antenna at 13.56 MHz with power supplied by three 100 kW fixed-frequency RF generators feeding a power combiner network followed by the matching network and launcher. The helicon source can utilize various gasses including hydrogen, deuterium, and helium, with a magnetic field strength in the source region up to 0.2 T, and maximum device |B| of 2.5 T. Power is coupled to ions via ion cyclotron heating at the fundamental resonance using a pair of phased helical antennas operating in the frequency range 4-9 MHz, that launch waves towards the resonance from the antenna region where ω > ωci. ICH power is supplied by a single 500 kW tunable RF transmitter through a 90° power splitter and matching/decoupling network. In the case of both the helicon and ICH systems the antennas are located external to the vacuum, with power transferred through novel water-cooled coaxial vacuum windows consisting of fused quartz outer cylinders and silicon nitride inner cylinders with forced convection water cooling between them. The antenna enclosures are pressurized with dry air to 3 bar absolute for voltage standoff.Several 3-D COMSOL models have been created to simulate the two systems. A model of the helicon region utilizing a cold plasma dielectric tensor with accurate magnetic field and realistic plasma density profiles has been used to calculate the plasma loading/complex antenna input impedance at the launcher feed for various ne and |B| values, for the purpose of estimating power handling. It also incorporates the geometry of all launcher structures relevant to this determination. A still more detailed model of the launcher together with a lossy dielectric plasma surrogate has been used to determine RF electric field values and power losses in the device components.Similar models have been produced to predict the performance and power handling of the ICH launcher. For this device the impedance matrix of the two-element antenna array is calculated using a warm plasma model, necessary to properly determine the wave propagation and absorption.

Goulding, Richard↗

DOE OSTI2023

Final Design and Analysis of the Superconducting Magnets for the Material Plasma Exposure Experiment

The Material Plasma Exposure eXperiment (MPEX), which has completed its final design, is a new linear plasma device to advance the understanding of plasma-material interactions through the generation and delivery of plasmas as they are expected in future fusion reactor divertors. MPEX will be a steady-state device to study high-fluence exposures of plasma-facing materials and components. The requirements for the magnetic field at the heating stages and the target make the application of superconducting coils necessary. The final designs for the superconducting magnets have been developed using three cryostat designs with warm bore diameters of 65 cm and 156 cm. The large bores are required to for other systems such as vacuum, water cooling, and RF power. There are 19 superconducting coils in MPEX that are contained in six cryostats. Although design, fabrication, and testing for the magnets as stand-alone units are straightforward, challenges will arise during the integration of the system. Various field profiles will be used during operation. The magnetic field where the electron cyclotron heating occurs needs to operate at both 1.25 and 2.50 T. Analyses that have been performed on the final design include designing the coils and determining operating currents to meet field requirements, forces between cryostats, the effects of coil and/or cryostat movement, and quench analysis. To ensure that the magnetic field requirements are met, a plan for monitoring the magnetic field at specified locations has been developed which includes the effect of coil and/or cryostat movement.

Burkhardt, Earle↗