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Reynosa-Martínez, Ana Cecilia

Publications and source records attributed to Reynosa-Martínez, Ana Cecilia.

Superhydrophobic to superhydrophilic wettability transition of functionalized SiO 2 nanoparticles

The superhydrophobic and superhydrophilic surfaces and their transitions are of great interest for the production of self-cleaning, anti-biofouling, or corrosion-resistant materials. This research reports the wettability transition from superhydrophobic to superhydrophilic SiO 2 nanoparticles functionalized with 1H, 1H, 2H, 2H-perfluorooctyltriethoxysilane (POTS) and induced by temperature. The functionalization of these nanoparticles was confirmed by Fourier transform infrared spectroscopy, X-ray photoelectron spectroscopy (XPS), and transmission electron microscopy. The functionalization of SiO 2 nanoparticles with POTS resulted in superhydrophobic surfaces with water contact angles up to 157°. A sudden transition to superhydrophilic behavior with water contact angles (WCA) below 5° was observed when the sample was heat-treated at 500 °C, despite the presence of fluorine on the surface of these nanoparticles, as confirmed by XPS and transmission electron microscopy. XPS suggested that the transition was caused by the change in orientation of the fluoroalkyl molecules and its partial decomposition due to the loss of the –CF 3 group, resulting in shorter chains with a tail-end group with C–O bonds, which promoted the superhydrophilicity.

36 MATERIALS SCIENCE↗

Controlled Reduction of Graphene Oxide Using Sulfuric Acid

Sulfuric acid under different concentrations and with the addition of SO 3 (fuming sulfuric acid) was studied as a reducing agent for the production of reduced graphene oxide (RGO). Three concentrations of sulfuric acid (1.5, 5, and 12 M), as well as 12 M with 30% SO 3 , were used. The reduction of graphene oxide increased with H 2 SO 4 concentration as observed by Fourier-transformed infrared spectroscopy and X-ray photoelectron spectroscopy. It was observed that GO lost primarily epoxide functional groups from 40.4 to 9.7% and obtaining 69.8% carbon when using 12 M H 2 SO 4 , without leaving sulfur doping. Additionally, the appearance of hexagonal domain structures observed in transmission electron microscopy and analyzed by selected area electron diffraction patterns confirmed the improvement in graphitization. Although the addition of SO 3 in H 2 SO 4 improved the GO reduction with 74% carbon, as measured by XPS, the use of SO 3 introduced sulfur doping of 1.3%. RGO produced with sulfuric acid was compared with a sample obtained via ultraviolet (UV) irradiation, a very common reduction route, by observing that the RGO produced with sulfuric acid had a higher C/O ratio than the material reduced by UV irradiation. This work showed that sulfuric acid can be used as a single-step reducing agent for RGO without sulfur contamination.

37 INORGANIC, ORGANIC, PHYSICAL, AND ANALYTICAL CH↗