Engineering topics

Roman, R. F.

Publications and source records attributed to Roman, R. F..

4 records

NASA NTRS1986

Textured carbon surfaces on copper by sputtering

A very thin layer of highly textured carbon is applied to a copper surface by a triode sputtering process. A carbon target and a copper substrate are simultaneously exposed to an argon plasma in a vacuum chamber. The resulting carbon surface is characterized by a dense, random array of needle like spires or peaks which extend perpendicularly from the copper surface. The coated copper is especially useful for electrode plates in multistage depressed collectors.

Curren, A. N.↗

NASA NTRS1986

Process Produces Low-Secondary-Electron-Emission Surfaces

Textured carbon layer applied to copper by sputtering. Carbon surface characterized by dense, random array of needle-like spires or peaks that extend perpendicularly from local copper surface. Spires approximately 7 micrometers in height and spaced approximately 3 micrometers apart, on average. Copper substrate essentially completely covered by carbon layer, is tenacious and not damaged by vibration loadings representative of multistage depressed collector (MDC) applications. Process developed primarily to provide extremely low-secondary-electron-emission surface for copper for use as highefficiency electrodes in MDC's for microwave amplifier traveling-wave tubes (TWT's). Tubes widely used in space communications, aircraft, and terrestrial applications.

Curren, A. N.↗

NASA NTRS1984

Ring-cusp ion thruster with shell anode

An improved ion thruster for low specific impulse operation in the 1500 sec to 6000 sec range has a multicusp boundary field provided by high strength magnets on an iron anode shell which lengthens the paths of electrons from a hollow cathode assembly. A downstream anode pole piece in the form of an iron ring supports a ring of magnets to provide a more uniform beam profile. A cylindrical cathode magnet can be moved selectively in an axial direction along a feed tube to produce the desired magnetic field at the cathode tip.

Sovey, J. S.↗

NASA NTRS1980

Hydrogen hollow cathode ion source

A source of hydrogen ions is disclosed and includes a chamber having at one end a cathode which provides electrons and through which hydrogen gas flows into the chamber. Screen and accelerator grids are provided at the other end of the chamber. A baffle plate is disposed between the cathode and the grids and a cylindrical baffle is disposed coaxially with the cathode at the one end of the chamber. The cylindrical baffle is of greater diameter than the baffle plate to provide discharge impedance and also to protect the cathode from ion flux. An anode electrode draws the electrons away from the cathode. The hollow cathode includes a tubular insert of tungsten impregnated with a low work function material to provide ample electrons. A heater is provided around the hollow cathode to initiate electron emission from the low work function material.

Mirtich, M. J., Jr.↗