Search NASA⌕ Search

Engineering topics

Ron Shiri

Publications and source records attributed to Ron Shiri.

8 records
All sourcesNASA NTRSDOE OSTI
NASA NTRS2021

Characterization of Bidirectional Transmissive and Reflective Properties of Black Silicon

This paper describes the initial work of characterizing the transmissive and reflective properties of black silicon diffusers. The diffusers were fabricated from a 100 mm diameter black silicon sample at NASA’s Goddard Space Flight Center (GSFC). The directional hemispherical reflectance from 250 nm to 2500 nm and BRDF/BTDF measurements at 632.8 nm, 1064 nm, and 1550 nm were measured using the GSFC Diffuser Calibration Laboratory’s (DCL) spectrophotometer and optical scatterometer. The diffusers exhibit a low level of specular reflection up to ~1100 nm with no evidence of retroscatter. The measurements are traceable to those made at the National Institute of Standards and Technology (NIST).

Bidirectional Reflectance Distribution Function↗
NASA NTRS2020

Measuring Large Amplitude Surface Figure Error using Coordinate Metrology

Advances in optical testing are as important as advances in optical fabrication, because one can make only what one can measure, particularly for unconventional prescriptions, like aspheric and freeform optics. A new, high-precision metrology capability is utilized to close the gap between interferometric testing and lower precision, contact-probe-based coordinate measuring machines or laser tracker/radar metrology to accurately measure surfaces with large figure error. This nearly universal optical testing method employs an ultra-precision coordinate measuring machine equipped with a non-contact probe. It was developed to characterize a broad spectrum of optical surfaces including ones with high slopes, impossible to measure using traditional interferometric testing. Optical components, covering a wide range of prescriptions, such as large convex conics, high-sloped aspherics, grazing-incidence x-ray optics, and highly deformed flats, were successfully measured. The resulting data were reduced using custom-developed routines to determine the optic’s alignment, surface departure from design, and the as-built optical prescription. This information guided the fabrication and modeling of these optical components

Manal Khreishi↗
NASA NTRS2019

The Bidirectional Reflectance of Black Silicon Used in Space and Earth Remote Sensing Applications

Space-based astrophysical and remote sensing observations often require the detection and measurement of light originating from distant and relatively faint objects. These observations are highly susceptible to scattered light which may introduce imaging artifacts, obscure object details, and increase measurement noise. This paper describes the initial work of characterizing representative black materials used in coronagraph instruments and other spaceborne instruments. Measurements of “blackness” and the achieved reflectance of black silicon are provided in the spectral range from 400nm to 2500nm using 8o directional hemispherical measurements. The bidirectional reflectance of black silicon was also measured at discrete wavelengths, 633nm, and 1064nm, using the optical scatterometer located at NASA Goddard Space Flight Center’s Diffuser Calibration Laboratory (DCL). A 100mm diameter black silicon sample was fabricated and optically characterized. The BRDF of other well-known black materials such as Z306 and Fractal Black are also presented and discussed.

BRDF↗
NASA NTRS2019

Highly Absorptive Pupil Mask Fabricated with Black Silicon

Many of NASA’s direct imaging of exoplanet missions and projects require fabricated coronagraph masks to control scattering and diffraction of light. The designed, patterned mask intended for the coronagraphic testbeds are highly absorptive in the visible range on non-metallic regions. In this work, we employed the cryogenic etching process to fabricate black silicon (BSi) to achieve a high aspect ratio (HAR) structures with higher etch rate than conventional reactive ion etching (REI). Recent bidirectional reflectance distribution function (BRDF) measurements of uniformly etched BSi on silicon wafer show highly diffusive BSi with a specular reflective component in the orders of seven magnitudes lower than the total hemispherical reflectance when the polarized or non-polarized incident beam is used.

black-silicon↗
NASA NTRS2019

Highly Absorptive Pupil Mask Fabricated with Black Silicon

Many of NASA’s direct imaging of exoplanet missions and projects require fabricated coronagraph masks to control scattering and diffraction of light. The designed, patterned mask intended for the coronagraphic testbeds are highly absorptive in the visible range on non-metallic regions. In this work, we employed the cryogenic etching process to fabricate black silicon (BSi) to achieve a high aspect ratio (HAR) structures with higher etch rate than conventional reactive ion etching (REI). Recent bidirectional reflectance distribution function (BRDF) measurements of uniformly etched BSi on silicon wafer show highly diffusive BSi with a specular reflective component in the orders of seven magnitudes lower than the total hemispherical reflectance when the polarized or non-polarized incident beam is used.

BRDF↗
NASA NTRSDate not supplied

Black-silicon as a Wideband Infrared Absorber for the Space Instruments: Fabrication, Modeling, and Characterization

The uniform black silicon (BSI) cryogenically etched has been demonstrated as a superior absorber in par with other ultra-absorbers such as carbon nano tubes in the visible and near-infrared spectrum. In this work, we discuss the fabrication, modeling, and characterization of the BSI aiming at the 2.5-5 microns range. We investigated a series of cryogenic parameters such as temperature, pressure, oxygen flowrate, power, and etching duration and fabricated a series of uniformly etched wafers. Additionally, we established at hree-dimensional mathematical model of a unit cell and manipulated the silicon needle geometry and shape. Our preliminary fabrication results show silicon needles of 8 micron height have five orders of magnitude specular reflectance in the infrared region. The modeling efforts how longer pillar heights could be better absorbers as the wavelength increases.

Wideband absorber↗