Engineering topics

Rouviere, Jean-Luc

Publications and source records attributed to Rouviere, Jean-Luc.

3 records

DOE OSTI2013

Improved strain precision with high spatial resolution using nanobeam precession electron diffraction

NanoBeam Electron Diffraction is a simple and efficient technique to measure strain in nanostructures. Here, we show that improved results can be obtained by precessing the electron beam while maintaining a few nanometer probe size, i.e., by doing Nanobeam Precession Electron Diffraction (N-PED). The precession of the beam makes the diffraction spots more uniform and numerous, making N-PED more robust and precise. In N-PED, smaller probe size and better precision are achieved by having diffraction disks instead of diffraction dots. Precision in the strain measurement better than 2 × 10{sup −4} is obtained with a probe size approaching 1 nm in diameter.

77 NANOSCIENCE AND NANOTECHNOLOGY↗

DOE OSTI2013

Towards rapid nanoscale measurement of strain in III-nitride heterostructures

We report the structural and compositional nanoscale characterization of InAlN/GaN nanoribbon-structured high electron mobility transistors (HEMTs) through the use of geometric phase analysis (GPA) and nanobeam electron diffraction (NBED). The strain distribution in the HEMT layer is quantified and compared to the expected strain profile for the nominal structure predicted by finite element analysis (FEA). Using the experimental strain results, the actual structure is determined and used to modify the FEA model. The improved fit of the model demonstrates that GPA and NBED provide a powerful platform for routine and rapid characterization of strain in III-V semiconducting device systems leading to insights into device evolution during processing and future device optimization.

77 NANOSCIENCE AND NANOTECHNOLOGY↗

DOE OSTI2013

Atomic resolution mapping of interfacial intermixing and segregation in InAs/GaSb superlattices: A correlative study

We combine quantitative analyses of Z-contrast images with composition analyses employing atom probe tomography (APT) correlatively to provide a quantitative measurement of atomic scale interfacial intermixing in an InAs/GaSb superlattice (SL). Contributions from GaSb and InAs in the Z-contrast images are separated using an improved image processing technique. Correlation with high resolution APT composition analyses permits an examination of interfacial segregation of both cations and anions and their incorporation in the short period InAs/GaSb SL. Results revealed short, intermediate, and long-range intermixing of In, Ga, and Sb during molecular beam epitaxial growth and their distribution in the SL.

75 CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND↗