Inductively Coupled Plasma Etching of InP with Cl2/H2/Ar Plasma.
Abstract not provided.
Douglas, Erica Ann↗
Engineering topics
Shul, Randy John
Publications and source records attributed to Shul, Randy John.
Hermetic Wafer-Level Packaging for RF MEMs: Effects on Resonator Performance.
Abstract not provided.
Henry, Michael David↗
Inductively Coupled Plasma Etching of Benzocyclobutene with SF6 Chemistry.
Abstract not provided.
Douglas, Erica Ann↗
Hermetic Wafer-Level Packaging for RF MEMs: Effects on Resonator Performance.
Abstract not provided.
Henry, Michael David↗
High precision fabrication of polarization insensitive resonant grating filters.
Abstract not provided.
Boye, Robert R.↗
A new Wafer-level Packaging Technology for MEMS with Hermetic Micro-environment.
Abstract not provided.
Nordquist, Christopher↗