Engineering topics

Smith, W. O.

Publications and source records attributed to Smith, W. O..

3 records

NASA NTRS1974

Formation of star tracking reticles

The present application is directed towards a process for producing high resolution, substantially non-reflective reticles or choppers suitable for use for transmitting in both the visible and near ultra-violet regions, able to withstand reasonable handling and extreme environmental conditions, and capable of operating at speeds of from 2800 to about 9000 revolutions per minute without distortion. In particular, the present invention is directed towards the production or reticles having a quartz base vacuum coated with chromium, chromium-silver alloy, and silver with electrodeposited copper and black chromium thereon, respectively, in the form of a reticle pattern. The quartz permits the transmission of light while the pattern is opaque to light. The reticles of the present invention are intended for use in optical trackers, such as star trackers used in outer space.

Smith, W. O.↗

NASA NTRS1974

Process for the production of star-tracking reticles

Reticles designed with quartz bases are masked with desired pattern and then are coated with highly adherent layers of chromium, chromium silver alloy, silver, copper, and black chromium (mixture of chromium and chromium oxides). Black chromium final layer produces required nonreflective surface.

Toft, A. R.↗

NASA NTRS1973

Star tracking reticles

A method for the production of reticles, particularly those for use in outer space, where the product is a quartz base coated with highly adherent layers of chromium, chromium-silver, and silver vacuum deposited through a mask, and then coated with an electrodeposit of copper from a copper sulfate solution followed by an electrodeposit of black chromium is described. The masks are produced by coating a beryllium-copper alloy substrate with a positive working photoresist, developing the photoresist, according to a pattern to leave a positive mask, plating uncoated areas with gold, removing the photoresist, coating the substrate with a negative working photoresist, developing the negative working photoresist to expose the base metal of the pattern, and chemically etching the unplated side of the pattern to produce the mask.

Smith, W. O.↗