Engineering topics

Spalvins, T.

Publications and source records attributed to Spalvins, T..

At least 55 records · Page 3

NASA NTRS1981

Frictional and morphological characteristics of ion plated soft, metallic films

Ion plated metallic films in contrast to films applied by other deposition techniques offer a lower friction coefficient, longer endurance lives and exhibit a gradual increase in friction coefficient after the film has been worn off. The friction coefficients of metallic films are affected by the degree of adherence, thickness and nucleation and growth characteristics during ion plating lead to a fine, continuous crystalline structure, which contributes to a lower friction coefficient.

Spalvins, T.↗

NASA NTRS1980

RF-sputtered and ion-plated solid lubricants

Report reviews advances in tribological uses of RF-sputtered and ion-plated films of solid film lubricants (laminar solids, soft metals, organic polymers) and wear-resistant refractory compounds.

Spalvins, T.↗

NASA NTRS1980

Tribological properties of sputtered MoS2 films in relation to film morphology

Thin sputter-deposited MoS2 films with thicknesses ranging from 2000 to 6000 A have shown excellent lubricating properties when sputtering parameters and substrate conditions are properly selected and controlled. The lubricating properties are strongly influenced by the crystalline-amorphous structure, morphology, and composition of the films. The coefficient of friction can range from 0.04 (which is effective lubrication) to 0.4 (no lubricating action).

Spalvins, T.↗

NASA NTRS1980

Tribological properties of sputtered MoS sub 2 films in relation to film morphology

Thin sputter deposited MoS2 films in the 2000 to 6000 A thickness range have shown excellent lubricating properties, when sputtering parameters and substrate conditions are properly selected and precisely controlled. The lubricating properties of sputtered MoS2 films are strongly influenced by their crystalline-amorphous structure, morphology and composition. The coefficient of friction can range from 0.04 which is effective lubrication to 0.4 which reflects an absence of lubricating properties. Visual screening and slight wiping of the as-sputtered MoS2 film can identify the integrity of the film. An acceptable film displays a black-sooty surface appearance whereas an unacceptable film has a highly reflective, gray surface and the film is hard and brittle.

Spalvins, T.↗

NASA NTRS1979

Survey of ion plating sources

Ion plating is a plasma deposition technique where ions of the gas and the evaporant have a decisive role in the formation of a coating in terms of adherence, coherence, and morphological growth. The range of materials that can be ion plated is predominantly determined by the selection of the evaporation source. Based on the type of evaporation source, gaseous media and mode of transport, the following will be discussed: resistance, electron beam sputtering, reactive and ion beam evaporation. Ionization efficiencies and ion energies in the glow discharge determine the percentage of atoms which are ionized under typical ion plating conditions. The plating flux consists of a small number of energetic ions and a large number of energetic neutrals. The energy distribution ranges from thermal energies up to a maximum energy of the discharge. The various reaction mechanisms which contribute to the exceptionally strong adherence - formation of a graded substrate/coating interface are not fully understood, however the controlling factors are evaluated. The influence of process variables on the nucleation and growth characteristics are illustrated in terms of morphological changes which affect the mechanical and tribological properties of the coating.

Spalvins, T.↗

NASA NTRS1979

Characterization of defect growth structures in ion plated films by scanning electron microscopy

Gold and copper films (0.2-2 micron thick) are ion plated on very smooth stainless steel 304 and mica surfaces. The deposited films are examined by SEM to identify the morphological growth of defects. Three types of coating defects are distinguished: nodular growth, abnormal or runaway growth, and spits. The potential nucleation sites for defect growth are analyzed to determine the cause of defect formation. It is found that nuclear growth is due to inherent surface microdefects, abnormal or runaway growth is due to external surface inclusions, and spits are due to nonuniform evaporation and ejection of droplets. All these defects have adverse effects on the coatings.

Spalvins, T.↗

NASA NTRS1979

Industrial potential, uses, and performance of sputtered and ion plated films

The sputtering and ion plating technology is reviewed in terms of potential, uses, and performance. Sputtering is not regulated by classical thermodynamics and Gibb's phase rule relationships, thus eliminating the restrictions for materials combinations, and consequently making possible tailoring of coatings in any preferred chemical combination. The future of sputtered and ion plated films for industrial applications is expected to depend primarily on greater comprehension of materials selection, and the utilization of the proper deposition parameters.

Spalvins, T.↗

NASA NTRS1979

Characterization of defect growth structure in ion plated films by scanning electron microscopy

Copper and gold films (0.2 to 2 microns) were ion plated onto polished 304-stainless-steel surfaces. These coatings were examined by scanning electron microscopy for coating growth defects. Three types of defects were distinguished: nodular growth, abnormal or runaway growth, and spits. The cause and origin for each type of defect was traced. Nodular growth is primarily due to inherent substrate microdefects, abnormal or runaway growth is due to external surface inclusions, and spits are due to nonuniform evaporation. All these defects have adverse effects on the coatings. They induce stresses and produce porosity in the coatings and thus weaken their mechanical properties. Friction and wear characteristics are affected by coating defects, since the large nodules are pulled out and additional wear debris is generated.

Spalvins, T.↗

NASA NTRS1979

Industrial potential, uses, and performance of sputtered and ion plated films

The sputtering and ion plating technology is reviewed in terms of their potential, uses and performance. It offers the greatest flexibility in coating preparation, since coatings can be tailored in any preferred chemical combination, and graded type interfaces (ceramic to metal seals) can be formed. Sputtered and ion plated film characteristics such as the degree of adherence, coherence and morphological growth which contribute to film performance and reliability are described and illustrated as used in practice. It is concluded that the potential future of sputtered and ion plated films for industrial applications will depend primarily upon greater comprehension of materials selection, possible elimination of restrictions for coating/substrate combinations and the awareness of utilizing the proper deposition parameters.

Spalvins, T.↗

NASA NTRS1979

Survey of ion plating sources

Based on the type of evaporation source, gaseous media and mode of transport, the following is discussed: resistance, electron beam, sputtering, reactive and ion beam evaporation. Ionization efficiencies and ion energies in the glow discharge determine the percentage of atoms which are ionized under typical ion plating conditions. The plating flux consists of a small number of energetic ions and a large number of energetic neutrals. The energy distribution ranges from thermal energies up to a maximum energy of the discharge. The various reaction mechanisms which contribute to the exceptionally strong adherence - formation of a graded sustrate/coating interface are not fully understood, however the controlling factors are evaluated. The influence of process variables on the nucleation and growth characteristics are illustrated in terms of morphological changes which affect the mechanical and tribological properties of the coating.

Spalvins, T.↗

NASA NTRS1978

Morphology of gold and copper ion-plated coatings

Copper and gold films (0.2 to 2 microns thick) were ion plated onto polished 304-stainless-steel, glass, mica surfaces. These coatings were examined by SEM for defects in their morphological growth. Three types of defects were distinguished: nodular growth, abnormal or runaway growth, and spits. The cause for each type of defect was investigated. Nodular growth is due to inherent substrate microdefects, abnormal or runaway growth is due to external surface inclusions, and spits are due to nonuniform evaporation (ejection of droplets). All these defects induce stresses and produce porosity in the coatings and thus weaken their mechanical properties. During surface rubbing, large nodules are pulled out, leaving vacancies in the coatings.

Spalvins, T.↗

NASA NTRS1978

Coatings for wear and lubrication

Recent advances in the tribological uses of rf-sputtered and ion plated films of solid film lubricants (laminar solids, soft metals, organic polymers) and wear resistant refractory compounds (carbides, nitrides, silicides) are reviewed. The sputtering and ion plating potentials and the corresponding coatings formed were evaluated relative to the friction coefficient, wear endurance life and mechanical properties. The tribological and mechanical properties for each kind of film are discussed in terms of film adherence, coherence, density, grain size, morphology, internal stresses, thickness, and substrate conditions such as temperature, topography, chemistry and dc-biasing. The ion plated metallic films in addition to improved tribological properties also have better mechanical properties such as tensile strength and fatigue life.

Spalvins, T.↗

NASA NTRS1978

Sputtering technology in solid film lubrication

Potential and present sputtering technology is discussed as it applies to the deposition of solid film lubricants particularly MoS2, WS2, and PTFE. Since the sputtered films are very thin, the selection of the sputtering parameters and substrate condition is very critical as reflected by the lubricating properties. It was shown with sputtered MoS2 films that the lubricating characteristics are directly affected by the selected sputtering parameters (power density, pressure, sputter etching, dc-biasing, etc.) and the substrate temperature, chemistry, topography and the environmental conditions during the friction tests. Electron microscopy and other surface sensitive analytical techniques illustrate the resulting changes in sputtered MoS2 film morphology and chemistry which directly influence the film adherence and frictional properties.

Spalvins, T.↗

NASA NTRS1978

Sputtering technology in solid film lubrication

Current and potential sputtering technology is reviewed as it applies primarily to the deposition of MoS2, though such lubricants as WS2 and PTFE are also considered. It is shown by electron microscopy and surface sensitive analytical techniques that the lubricating properties of sputtered MoS2 films are directly influenced by the sputtering parameters selected (i.e., power density, pressure, sputter etching, dc-biasing, etc.), substrate temperature, chemistry, topography, and environmental conditions during the friction test. Electron micrographs and diffractograms of sputtered MoS2 films clearly show the resultant changes in film morphology which affect film adherence and frictional properties.

Spalvins, T.↗

NASA NTRS1978

Coatings for wear and lubrication

In this paper we review the recent advances in the tribological uses of R.F.-sputtered and ion-plated films of solid film lubricants (laminar solids, soft metals, organic polymers) and wear-resistant refractory compounds (carbides, nitrides, silicides). The sputtering and ion-plating potentials and the corresponding coatings formed are evaluated relative to the friction coefficient, wear endurance life and mechanical properties. The tribological and mechanical properties of each kind of film are discussed in terms of film adherence, coherence, density, grain size, morphology, internal stresses and thickness and substrate conditions such as temperature, topography, chemistry and d.c. biasing. The ion-plated metallic films in addition to improved tribological properties also have better mechanical properties such as tensile strength and fatigue life.

Spalvins, T.↗

NASA NTRS1977

The new applications of sputtering and ion plating

The potential industrial applications of sputtering and ion plating are strictly governed by the unique features these methods possess. The outstanding features of each method, the resultant coating characteristics and the various sputtering modes and configurations are discussed. New, more complex coatings and deposits can be developed such as graded composition structures (metal-ceramic seals), laminated and dispersion strengthened composites which improve the mechanical properties and high temperature stability. Specific industrial areas where future effort of sputtering and ion plating will concentrate to develop intricate alloy or compound coatings and solve difficult problem areas are discussed.

Spalvins, T.↗

NASA NTRS1977

Effect of ion-plated films of germanium and silicon on friction, wear, and oxidation of 52100 bearing steel

Friction and wear experiments were conducted with ion plated films of germanium and silicon on the surface of 52100 bearing steel both dry and in the presence of mineral oil. Both silicon and germanium were found to reduce wear, with germanium being more effective than silicon. An optimum film thickness of germanium for minimum wear without surface crack formation was found to be approximately 400 nanometers (4000 A). The presence of silicon and germanium on the 52100 bearing steel surface improved resistance to oxidation.

Buckley, D. H.↗

NASA NTRS1977

Microstructural and wear properties of sputtered carbides and silicides

Sputtered Cr3C2, Cr3Si2, and MoSi2 wear-resistant films (0.05 to 3.5 microns thick) were deposited on metal and glass surfaces. Electron transmission, electron diffraction, and scanning electron microscopy were used to determine the microstructural appearance. Strong adherence was obtained with these sputtered films. Internal stresses and defect crystallographic growth structures of various configurations within the film have progressively more undesirable effects for film thicknesses greater than 1.5 microns. Sliding contact and rolling element bearing tests were performed with these sputtered films. Bearings sputtered with a duplex coating (0.1-micron-thick undercoating of Cr3Si2 and subsequently 0.6-micron coating of MoS2) produced marked improvement over straight MoS2 films.

Spalvins, T.↗