Research on digital transducer principles. Volume 10 - Thin film titanium dioxide by chemical vapor deposition, 1 July - 31 December 1968
Thin film titanium dioxide by high temperature vapor deposition
Harbison, D. R.↗
Engineering topics
Taylor, H. L.
Publications and source records attributed to Taylor, H. L..
The Poole-Frenkel effect with compensation present.
Poole-Frenkel model for internal field assisted thermal emission with compensation for relative densities of donor and acceptor sites
Taylor, H. L.↗
Conduction properties of pyrolytic silicon nitride films.
Conduction properties of silicon nitride thin films noting temperature dependence and thermal emission
Taylor, H. L.↗
Chemical vapor deposition of thin film dielectrics.
Chemical vapor deposition of titanium oxide thin film with good dielectric properties
Harbison, D. R.↗
Research on digital transducer principles. Volume IV - Charge transport mechanisms in thin silicon nitride films, July 1, 1966 - June 30, 1967
Charge transport mechanism in thin silicon nitride films
THIN FILM↗
Deposition of silicon nitride on metal-coated substrates.
Silicon nitride deposition on metal coated substrates for studying resistivity, breakdown strength and other electrical properties of thin dielectric films
SILICON NITRIDE↗