Engineering topics

Thomson, Clint

Publications and source records attributed to Thomson, Clint.

5 records

NASA NTRS2014

Non-Intrusive Sensor for In-Situ Measurement of Recession Rate of Ablative and Eroding Materials

A non-intrusive sensor for in-situ measurement of recession rate of heat shield ablatives. An ultrasonic wave source is carried in the housing. A microphone is also carried in the housing, for collecting the reflected ultrasonic waves from an interface surface of the ablative material. A time phasing control circuit is also included for time-phasing the ultrasonic wave source so that the waves reflected from the interface surface of the ablative material focus on the microphone, to maximize the acoustic pressure detected by the microphone and to mitigate acoustic velocity variation effects through the material through a de-coupling process that involves a software algorithm. A software circuit for computing the location off of which the ultrasonic waves scattered to focus back at the microphone is also included, so that the recession rate of the heat shield ablative may be monitored in real-time through the scan-focus approach.

Papadopoulos, George↗

NASA NTRS2005

Measurements of Electrical and Electron Emission Properties of Highly Insulating Materials

Highly insulating materials often acquire significant charges when subjected to fluxes of electrons, ions, or photons. This charge can significantly modify the materials properties of the materials and have profound effects on the functionality of the materials in a variety of applications. These include charging of spacecraft materials due to interactions with the severe space environment, enhanced contamination due to charging in Lunar of Martian environments, high power arching of cables and sources, modification of tethers and ion thrusters for propulsion, and scanning electron microscopy, to name but a few examples. This paper describes new techniques and measurements of the electron emission properties and resistivity of highly insulating materials. Electron yields are a measure of the number of electrons emitted from a material per incident particle (electron, ion or photon). Electron yields depend on incident species, energy and angle, and on the material. They determine the net charge acquired by a material subject to a give incident flu. New pulsed-beam techniques will be described that allow accurate measurement of the yields for uncharged insulators and measurements of how the yields are modified as charge builds up in the insulator. A key parameter in modeling charge dissipation is the resistivity of insulating materials. This determines how charge will accumulate and redistribute across an insulator, as well as the time scale for charge transport and dissipation. Comparison of new long term constant-voltage methods and charge storage methods for measuring resistivity of highly insulating materials will be compared to more commonly used, but less accurate methods.

Dennison, J. R.↗

NASA NTRS2005

Evolution of the Electron Yield Curves of Insulators as a Function of Impinging Electron Fluence and Energy

Electron emission and concomitant change accumulation near the surface of insulators in central to understanding spacecraft charging. We present a study of changes in electron emission yields as a result of internal charge build up due to electron dose. Evolution of total, backscattered and secondary yield results over a broad range of incident energies are presented for two representative insulators, Kapton(trademark) and Al2O3. Reliable yield curves for uncharged insulators are measured and quantifiable changes in yield are observed due to < 100 fC/sq mm fluences. We find excellent agreement with a phenomenological argument based on insulator charging predicted by the yield curve; this includes a decrease in the rate of change of the yield as incident energies approach the crossover energies and as accumulated internal charge reduces the landing energy to asymptotically approach a steady state surface charge and unity yield. We also find that the exponential decay of yield curves with fluence exhibit an energy dependent decay constant, alpha(E). Finally, we discuss physics based models for this energy dependence. To understand fluence and energy dependence of these charging processes requires knowledge of how charge is deposited within the insulator, the mechanisms for charge trapping and transport within the insulator, and how the profile of trapped charge affects the transport and emission of charges from insulators.

Sim, Alec↗

NASA NTRS2005

Effects of Incident Electron Fluence and Energy on the Election Yield Curves and Emission Spectra of Dielectrics

We present an experimental study of evolution of electron emission yields and spectra as a result of internal charge build up due to electron dose. Reliable total, backscattered and secondary yield curves and electron emission spectra for un-charged insulators using a low fluence, pulsed electron beam (= or < 5 microsec at = or < 3 nA/sq mm or = or < 10(exp 5) e/sq mm per pulse) with low energy electron and UV flooding to neutralize the charging between pulses. Quantifiable changes in yield curves are observed due to < 100 fC/sq mm fluences for several excellent dielectric thin film materials. We find good agreement with a phenomenological argument based on insulator charging predicted by the yield curve; this includes an approximately linear decrease in the magnitude of the yield as incident energies approach the crossover energies and an exponential decrease in yield as accumulated internal charge reduces the landing energy to asymptotically approach a steady state surface charge and unity yield. We also find that the exponential decay of yield curves with fluence exhibit an energy dependent decay constant, alpha(E), over a broad range of incident energies below, between and above the crossover energies. Finally, we present some preliminary physics-based models for this energy dependence and attempt to relate our charging measurements to knowledge of how charge is deposited within the insulator, the mechanisms for charge trapping and transport, and how the profile of trapped charge affects the transport and emission of charges from insulators.

Sim, Alec↗

NASA NTRS1999

The Conductor-Dielectric Junctions in a Low Density Plasma

A conductor-dielectric junction exposed to the space environment is a frequent spacecraft design feature. Due to spacecraft charging and/or solar array operation, the conductor can acquire a high potential with respect to the surrounding plasma. If this potential is positive the insulators adjacent to exposed conductors can collect current as if they were conductors themselves. This phenomenon, called snapover, results in a substantial increase in current collection, and may even result in a glow discharge if the potential is high enough. If a conductor has a negative potential, arcing can occur at the site of a junction. Both of these phenomena negatively affect spacecraft operation. To prevent negative consequences, the physical mechanisms of snapover and arc inception require investigation. In this paper, results are presented of an experimental and theoretical study of snapover, glow discharge, and arc phenomena for different materials immersed in argon or xenon plasmas. The effect of snapover is investigated for several metal-dielectric junctions: copper-teflon, copper-Kapton, copper-glass, aluminum-teflon, aluminum-Kapton, steel-teflon, anodized aluminum with pinholes, and copper-ceramics. I-V curves are measured and snapover inception voltages, essential parameters (increase in current and collection area due to secondary electrons), and glow discharge inception thresholds are determined. Optical spectra are obtained for glow discharges in both argon and xenon plasmas. These spectra provide information regarding atomic species entrapped in the glow region. Some spectral lines can be used to estimate plasma parameters in the discharge area. A video-camera and linear array were used to confirm that snapover inception is accompanied by very low intensity visible light emission. This result seems to be important for the estimate of the light pollution around spacecraft. Optical spectra (wavelengths 380-650 nm) of arcs are also obtained on a negatively biased chromic acid anodized aluminum plate immersed in low density argon and xenon plasmas. Analysis of these spectra confirms our earlier findings that aluminum atoms are ejected from the arc site. Moreover, it is found that chromium atoms are also quite abundant in the arc plasma. It is believed that the latter results contribute considerably to the understanding of processes of plasma contamination caused by arcing.

Vayner, Boris↗