Engineering topics

Toft, Albert R.

Publications and source records attributed to Toft, Albert R..

6 records

NASA NTRS1993

Long-duration orbital effects on optical coating materials

We flew specimens of eight different optical coating materials in low earth orbit as part of the Long Duration Exposure Facility manifest to determine their ability to withstand exposure to the residual atomic 0 and other environmental effects at those altitudes. We included samples of Al, Au, Ir, Os, Pt, Al + MgF2, Al + SiO(x), and chemical-vapor-deposited SiC, representing reflective optical applications from the vacuum ultraviolet through the visible portions of the spectrum. We found that the majority of the materials suffered sufficient reflectance degradation to warrant careful consideration in the design of future space-flight instrumentation.

Herzig, Howard↗

NASA NTRS1992

Variability in the vacuum-ultraviolet transmittance of magnesium fluoride windows

Sample window materials tested during the development of a domed magnesium fluoride detector window for the Hubble Space Telescope's Imaging Spectrograph are noted to exhibit wide variability in VUV transmittance; a test program was accordingly instituted to maximize a prototype domed window's transmittance. It is found that VUV transmittance can be maximized if the boule from which the window is fashioned is sufficiently large to allow such a component to be cut from the purest available portion of the boule.

Herzig, Howard↗

NASA NTRS1990

Optical surface refurbishment in space environment

The potential use of the vacuum environment of space to clean contaminated mirror surfaces or generate Al mirror surfaces with high reflectance in the 80-200-nm region is discussed and illustrated with diagrams and graphs, reviewing previous studies and current experiment proposals. Consideration is given to (1) applying the atomic oxygen plasma environment of LEO to clean coated mirrors and (2) depositing freshly evaporated Al onto a mirror surface in vacuum, providing relatively long periods of high EUV reflectance before oxidation of the surface degrades performance: such a procedure could be performed as a maintenance measure or even incorporated into the design of a space observatory. A free-flying experiment is described which would produce and maintain an Al surface with controlled exposure to OH, H2O, and O2; demonstrate directed-beam Al deposition onto a simulated telescope/spectrometer surface; monitor instrument reflectance/sensitivity over time; and demonstrate in situ refurbishment of the degraded surface.

Heaney, James B.↗

NASA NTRS1988

Normal incidence reflectance of ion beam deposited SiC films in the EUV

Results are presented from an experimental investigation of the normal-incidence reflectance at 58.4, 92.0, and 121.6 nm wavelength of 30- and 80-nm-thick SiC films produced by ion-beam deposition on unheated 5 x 5-cm microscope slides. The films were deposited in the 2-m evaporator described by Bradford et al. (1969) with chamber base pressure 1 microtorr, operating pressure 40 microtorr, and a 50-62-mA 750-eV Ar ion beam; the reflectance measurements were obtained in the reflector-monochromator system described by Osantowski (1974). Reflectances of over 30 percent were found at 92 and 121.6 nm, almost equal to those of polished CVD films of SiC and degrading only slightly after aging for 4 months. It is suggested that ion-beam deposition may be the best low-temperature technique for coating EUV optics for space astronomy.

Keski-Kuha, Ritva A. M.↗

NASA NTRS1988

Grazing incidence reflectance of SiC films produced by plasma-assisted chemical vapor deposition

The grazing incidence reflectance of silicon carbide films produced by plasma-assisted chemical vapor deposition has been evaluated in the spectral region from 256 to 1216 A. The results show that reflectivities higher than conventional coatings can be obtained on coatings deposited both on silicon wafers and quartz substrates. Potential application of silicon carbide films for EUV astronomical instruments will be discussed.

Keski-Kuha, Ritva A. M.↗

NASA NTRS1972

Process for the Production of Star Tracklng [Tracking] Reticles

A method for the production of reticles, particularly those for use in outer space, wherein the product is a quartz base coated with highly adherent layers of chromium, chromium-silver, and silver vacuum deposited through a mask, and then coated with an electrodeposit of copper from a copper sulfate solution followed by an electrodeposit of black chromium. The masks are produced by coating a beryllium-copper alloy substrate with a positive working photoresist, developing the photoresist according to a pattern to leave a positive mask, plating uncoated areas with gold, removing the photoresist, coating the substrate with a negative working photoresist, developing the negative working photoresist to expose the base metal of the pattern, and chemically etching the unplated side of the pattern to produce the mask. The mask produced is then used in the vacuum deposition of: (1) chromium metal on the surface of a quartz base to obtain a highly adherent quartz-chromium interface; (2) silver on the chromium deposit, during the final stage of chromium deposit, to produce a silver chromium alloy layer; and (3) silver onto the surface of the alloy layer. The coated quartz base is then coated by electroplating utilizing an acid copper deposit followed by a black chromium electrodeposit to produce the product of the present invention.

Smith, Wade O.↗