Engineering topics

Waltmann, Tommy

Publications and source records attributed to Waltmann, Tommy.

2 records

DOE OSTI2026

Raw electron microscopy images for "The Importance of Nano-edges in Atomic Stencilling and Chiroptically Active Assembly of Patchy Gold Tetrahedra"

This dataset contains the raw transmission electron microscopy (TEM) and scanning electron microscopy (SEM) images used in the main figures of the paper “The Importance of Nano-edges in Atomic Stencilling and Chiroptically Active Assembly of Patchy Gold Tetrahedra (2026).” All the images were acquired at the Materials Research Laboratory, University of Illinois at Urbana-Champaign, by Qian Chen group. 1. We provide five subfolders, each named according to the corresponding figure numbers in the paper. 2. All files in the subfolders for Figures 1–3 and 5 are named as "Panel [letter]_*", where [letter] (e.g., a, b, c) represents the raw images used for the corresponding panels. 3. All files in the subfolder for Figure 4 correspond to panel f and show the configurations of patchy tetrahedra synthesized at varying concentrations of iodide and 2-naphthalenethiol. They are named "Experiment_[number]", where [number] represents the corresponding data points in the phase diagram. 4. In TEM images, the bright and dark regions indicate the polymer patches and nanoparticle cores, respectively. 5. In SEM images, the bright and dark regions indicate the nanoparticle cores and polymer patches, respectively. 6. Abbreviations in file names: HAADF-STEM (high-angle annular dark-field scanning transmission electron microscopy), PINEM (photon-induced near-field electron microscopy), and RCP/LCP (left-/right-handed circularly polarized).

chirality↗

DOE OSTI2025

Patchy nanoparticles by atomic stencilling

Stencilling, in which patterns are created by painting over masks, has ubiquitous applications in art, architecture and manufacturing. Modern, top-down microfabrication methods have succeeded in reducing mask sizes to under 10 nm, enabling ever smaller microdevices as today’s fastest computer chips. Meanwhile, bottom-up masking using chemical bonds or physical interactions has remained largely unexplored, despite its advantages of low cost, solution-processability, scalability and high compatibility with complex, curved and three-dimensional (3D) surfaces. Here we report atomic stencilling to make patchy nanoparticles (NPs), using surface-adsorbed iodide submonolayers to create the mask and ligand-mediated grafted polymers onto unmasked regions as ‘paint’. We use this approach to synthesize more than 20 different types of NP coated with polymer patches in high yield. Polymer scaling theory and molecular dynamics (MD) simulation show that stencilling, along with the interplay of enthalpic and entropic effects of polymers, generates patchy particle morphologies not reported previously. These polymer-patched NPs self-assemble into extended crystals owing to highly uniform patches, including different non-closely packed superlattices. We propose that atomic stencilling opens new avenues in patterning NPs and other substrates at the nanometre length scale, leading to precise control of their chemistry, reactivity and interactions for a wide range of applications, such as targeted delivery, catalysis, microelectronics, integrated metamaterials and tissue engineering.

36 MATERIALS SCIENCE↗