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Wang, Tianyi

Publications and source records attributed to Wang, Tianyi.

7 records
All sourcesNASA NTRSDOE OSTI
DOE OSTI2024

Simulation Study of High-Precision Characterization of MeV Electron Interactions for Advanced Nano-Imaging of Thick Biological Samples and Microchips

The resolution of a mega-electron-volt scanning transmission electron microscope (MeV-STEM) is primarily governed by the properties of the incident electron beam and angular broadening effects that occur within thick biological samples and microchips. A precise understanding and mitigation of these constraints require detailed knowledge of beam emittance, aberrations in the STEM column optics, and energy-dependent elastic and inelastic critical angles of the materials being examined. This simulation study proposes a standardized experimental framework for comprehensively assessing beam intensity, divergence, and size at the sample exit. This framework aims to characterize electron-sample interactions, reconcile discrepancies among analytical models, and validate Monte Carlo (MC) simulations for enhanced predictive accuracy. Our numerical findings demonstrate that precise measurements of these parameters, especially angular broadening, are not only feasible but also essential for optimizing imaging resolution in thick biological samples and microchips. By utilizing an electron source with minimal emittance and tailored beam characteristics, along with amorphous ice and silicon samples as biological proxies and microchip materials, this research seeks to optimize electron beam energy by focusing on parameters to improve the resolution in MeV-STEM/TEM. This optimization is particularly crucial for in situ imaging of thick biological samples and for examining microchip defects with nanometer resolutions. Our ultimate goal is to develop a comprehensive mapping of the minimum electron energy required to achieve a nanoscale resolution, taking into account variations in sample thickness, composition, and imaging mode.

36 MATERIALS SCIENCE↗
DOE OSTI2024

A comprehensive review of dwell time optimization methods in computer-controlled optical surfacing

Dwell time plays a vital role in determining the accuracy and convergence of the computer-controlled optical surfacing process. However, optimizing dwell time presents a challenge due to its ill-posed nature, resulting in non-unique solutions. To address this issue, several well-known methods have emerged, including the iterative, Bayesian, Fourier transform, and matrix-form methods. Despite their independent development, these methods share common objectives, such as minimizing residual errors, ensuring dwell time's positivity and smoothness, minimizing total processing time, and enabling flexible dwell positions. This paper aims to comprehensively review the existing dwell time optimization methods, explore their interrelationships, provide insights for their effective implementations, evaluate their performances, and ultimately propose a unified dwell time optimization methodology.

36 MATERIALS SCIENCE↗
DOE OSTI2024

Two-step retrace error calibration removing tilt ambiguity in coherence scanning interferometry

In interferometry measurement, the retrace error often limits its high-precision metrology applications. Retrace error calibration with tilted flats can give a relation between the retrace error and the introduced tilt angles, but there is still an ambiguity between the introduced tilt angles and the tilt terms in the created retrace error. Here, we propose a novel, to the best of our knowledge, two-step calibration method to resolve this tilt ambiguity. It involves additional measurements of spherical mirror(s) with known curvature(s). The experiment shows that the curvature deviation due to the tilt ambiguity can be significantly reduced after applying the proposed method.

36 MATERIALS SCIENCE↗
DOE OSTI2023

Collimated phase measuring deflectometry

Phase measuring deflectometry has been applied for free-form specular surface metrology, but its measured slope results are sensitive to the depth of sample positioning, which is also called the height-slope ambiguity. The objective of this work is to tackle this height-slope ambiguity problem. The main idea is to introduce collimated camera rays using a telecentric imaging lens and collimated structured-light illumination with a Fourier lens. This setup makes the fringe phases become only sensitive to the surface slopes and insensitive to the depth of the sample positioning. In this way, the slope calculation is theoretically independent of the sample depth. We call this new deflectometry technique Collimated Phase Measuring Deflectometry (CPMD). With our developed CPMD experimental setup, the measurement is insensitive to the depth of sample positioning, e.g., the measured height dispersion is less than 30 nm RMS within a 10 mm depth range when measuring a 50-mm-diameter spherical mirror with a 200 mm radius of curvature. In conclusion, the merits and limitations of the proposed CPMD technique are discussed, revealing its prospects in practical metrology applications and potential future investigations.

36 MATERIALS SCIENCE↗