@misc{indiciaef366b478ea6f,
  title = {A CMOS-compatible process technique for fabricating laterally embedded multi-nanaochannels without sacrificial etching},
  author = {Yang, E. and Lee, C. and Myung, N. and George, T.},
  year = {2003},
  url = {https://ntrs.nasa.gov/citations/20060030484},
  note = {Source identifier: 20060030484}
}