@misc{indiciae243f0694ed51,
  title = {Creating Facets in Photoresist Using Plasma Etch Processing.},
  author = {Sovey, Erin Lynn and Bauer, Todd},
  year = {2017},
  url = {https://www.osti.gov/biblio/1367196},
  note = {Source identifier: 1367196}
}