@misc{indiciaeb1ee7c0419c7,
  title = {Reactive ion etched, self-aligned, selective area poly-Si/SiO 2 passivated contacts},
  author = {Young, David L. and Chen, Kejun and Theingi, San and LaSalvia, Vincenzo and Diercks, David and Guthrey, Harvey and Nemeth, William and Page, Matthew and Stradins, Pauls},
  year = {2020},
  doi = {10.1016/j.solmat.2020.110621},
  url = {https://www.osti.gov/biblio/1726066},
  note = {Source identifier: 1726066}
}