TY  - RPRT
TI  - Enabling Efficiencies > 22.5% with Metal Oxide Passivating Contacts using Low-Cost Spatial Atomic Layer Deposition (Final Technical Report)
AU  - Davis, Kristopher Olan
AU  - Gregory, Geoffrey
PY  - 2020
DO  - 10.2172/1754992
UR  - https://www.osti.gov/biblio/1754992
ID  - 1754992
ER  -