@misc{indiciae4eb92324dfe8,
  title = {Sapphire advanced mitigation process: wet etch to expose sub-surface damage and increase laser damage resistance and mechanical strength},
  author = {Suratwala, T. and Steele, R. and Destino, J. and Wong, L. and Norton, M. and Laurence, T. and Aracne-Ruddle, C. and Miller, P. and Shen, N. and Feit, M. and Ray, N. and Carr, W. and Rivers, C. and Peters, V. and Jeppson, S. and Malone, D. and Greene, W.},
  year = {2020},
  doi = {10.1364/ao.381739},
  url = {https://www.osti.gov/biblio/1769156},
  note = {Source identifier: 1769156}
}