@misc{indiciaecb6e2c952b4f,
  title = {Electron beam injection from a hollow cathode plasma into a downstream reactive environment: Characterization of secondary plasma production and Si 3 N 4 and Si etching},
  author = {Li, Chen and Godyak, Valery and Hofmann, Thorsten and Edinger, Klaus and Oehrlein, Gottlieb S.},
  year = {2020},
  doi = {10.1116/1.5143537},
  url = {https://www.osti.gov/biblio/1779714},
  note = {Source identifier: 1779714}
}