@misc{indiciaebbe93378fca5,
  title = {Etching with electron beam-generated plasmas: Selectivity versus ion energy in silicon-based films},
  author = {Walton, S. G. and Boris, D. R. and Rosenberg, S. G. and Miyazoe, H. and Joseph, E. A. and Engelmann, S. U.},
  year = {2021},
  doi = {10.1116/6.0000868},
  url = {https://www.osti.gov/biblio/1782568},
  note = {Source identifier: 1782568}
}