@misc{indiciae2092a6bc6694,
  title = {CO 2 –Based Dual–Tone Resists for Electron Beam Lithography},
  author = {Lu, Xin-Yu and Luo, Hao and Wang, Kai and Zhang, Yao-Yao and Zhu, Xiao-Feng and Li, Dongxue and Ma, Bingze and Xiong, Shisheng and Nealey, Paul F. and Li, Qiang and Wu, Guang-Peng},
  year = {2020},
  doi = {10.1002/adfm.202007417},
  url = {https://www.osti.gov/biblio/1840930},
  note = {Source identifier: 1840930}
}