@misc{indiciae515c27bdcaac,
  title = {Analysis of the negative charges injected into a SiO 2 /SiN x stack using plasma charging technology for field-effect passivation on a boron-doped silicon surface},
  author = {Min, Kwan Hong and Hwang, Jeong‐Mo and Cho, Eunwan and Song, Hee‐eun and Park, Sungeun and Rohatgi, Ajeet and Kim, Donghwan and Lee, Hae‐Seok and Kang, Yoonmook and Ok, Young‐Woo and Kang, Min Gu},
  year = {2020},
  doi = {10.1002/pip.3340},
  url = {https://www.osti.gov/biblio/1848496},
  note = {Source identifier: 1848496}
}