TY  - RPRT
TI  - Analysis of the negative charges injected into a SiO 2 /SiN x stack using plasma charging technology for field-effect passivation on a boron-doped silicon surface
AU  - Min, Kwan Hong
AU  - Hwang, Jeong‐Mo
AU  - Cho, Eunwan
AU  - Song, Hee‐eun
AU  - Park, Sungeun
AU  - Rohatgi, Ajeet
AU  - Kim, Donghwan
AU  - Lee, Hae‐Seok
AU  - Kang, Yoonmook
AU  - Ok, Young‐Woo
AU  - Kang, Min Gu
PY  - 2020
DO  - 10.1002/pip.3340
UR  - https://www.osti.gov/biblio/1848496
ID  - 1848496
ER  -