@misc{indiciae93af178e3b3c,
  title = {Ultrathin ferroic HfO 2 –ZrO 2 superlattice gate stack for advanced transistors},
  author = {Cheema, Suraj S. and Shanker, Nirmaan and Wang, Li-Chen and Hsu, Cheng-Hsiang and Hsu, Shang-Lin and Liao, Yu-Hung and San Jose, Matthew and Gomez, Jorge and Chakraborty, Wriddhi and Li, Wenshen and Bae, Jong-Ho and Volkman, Steve K. and Kwon, Daewoong and Rho, Yoonsoo and Pinelli, Gianni and Rastogi, Ravi and Pipitone, Dominick and Stull, Corey and Cook, Matthew and Tyrrell, Brian and Stoica, Vladimir A. and Zhang, Zhan and Freeland, John W. and Tassone, Christopher J. and Mehta, Apurva and Saheli, Ghazal and Thompson, David and Suh, Dong Ik and Koo, Won-Tae and Nam, Kab-Jin and Jung, Dong Jin and Song, Woo-Bin and Lin, Chung-Hsun and Nam, Seunggeol and Heo, Jinseong and Parihar, Narendra and Grigoropoulos, Costas P. and Shafer, Padraic and Fay, Patrick and Ramesh, Ramamoorthy and Mahapatra, Souvik and Ciston, Jim and Datta, Suman and Mohamed, Mohamed and Hu, Chenming and Salahuddin, Sayeef},
  year = {2022},
  doi = {10.1038/s41586-022-04425-6},
  url = {https://www.osti.gov/biblio/1875694},
  note = {Source identifier: 1875694}
}